Complex Oxide Sputtering Target Market Size & Share, Global IndustryAnalysis


• The complex oxide sputtering target market was valued at USD 2.2 Bn in 2021. The market is projected to grow USD 6.7 Bn in 2028, at a CAGR of 5.5%.
• A sputtering target is a material that is used to create thin films in a technique known as sputter deposition, or thin film deposition. Arc-melting or radiofrequency melting of a mixture of metals in a vacuum or inert-gas atmosphere can easily produce multielemental alloy sputtering targets. Sputtering is a method of depositing thin films of various materials in semiconductors fabrication that is widely utilised in the semiconductor industry. Sputtering is also used to produce thin antireflection coatings on glass for optical applications.
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January 2021- The Mitsubishi Corp. launched a new sputtering target (DIABLA) for blackening films and started mass production.
August 2019- ULVAC, Inc. successfully launched PZT piezoelectric thin-film sputtering technology and a high volume manufacturing (HVM) solution for the development of actuators and MEMS sensors for high-quality film and reliable production for nextgeneration devices.
• American Elements
• Hitachi Metals, Ltd.
• Heraeus
• Admat Inc.
• Materion Corporation
• RHP-Technology GmbH
• Plansee SE
• Kurt J. Lesker Company
• Otto Chemie Pvt. Ltd.
• North America region is dominating the market share of global complex oxide sputtering target market owing to the high product demand in major end-use industries coupled with the presence of key market players such as American Elements (US) and ASM International (US). However, Asia Pacific is expected to witness highest growth rate during the forecast period of complex oxide sputtering target market due to the rising population and urbanization activities. Rising industrial growth, environmental concerns, increased disposable income, and increasing adoption of complex oxide sputtering targets in the end-use industries in developing countries particularly China and India are driving consequently fueling the demand for global complex oxide sputtering target market.
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