HIGH-PERFORMANCE CRITICAL DIMENSIONAL MEASUREMENT SYSTEM. The VIEW Microline systems are high-performance critical dimensional measurement system for MEMs, wafers, masks, and other micro-fabricated devices in situations when there is no need for a fully automated operation.
The MicroLine systems feature the highest quality microscope optics, motorized autofocus, manually operated stages, and fully programmable illumination and measurement recipes. Microline systems are capable enough to measure bright and dark lines, irregular edges lines, semi-transparent layers and other essential features.
Microline systems are critical dimensional measurement systems that are suitable for measuring wafers, MEMS, masks, and other micro-fabricated parts. These capable desktop devices provide accurate optical measurement for features as small as 0.5 µm on parts up to 300 x 300 mm. With its advanced optics and lighting, MicroLine boasts powerful capabilities for measuring transparent layers, lines with irregular edges, and more.
Critical dimensional measurement systems Because of the greater emphasis on precision than accuracy, many measurements made in semiconductor fabrication facilities are not traceable to the SI (System International d Unites or International System of Units) unit of length. However, You can overemphasized the need of accuracy as the feature sizes of integrated circuits decreases and lithography model is more prevalent.