Global Photolithography Equipment Market Size, Share & Market Forecast 2026

2016 – 2026 GLOBAL PHOTOLITHOGRAPHY EQUIPMENT MARKET FORECAST & OPPORTUNITIES

www.techsciresearch.com MARKET INTELLIGENCE . CONSULTING

Scope of Report

Product of Interest (POI): Photolithography Equipment

Photolithography, also called optical lithography or UV lithography, is a process used in microfabrication to pattern parts on a thin film or the bulk of a substrate (also called a wafer). It uses light to transfer a geometric pattern from a photomask (also called an optical mask) to a photosensitive (that is, light-sensitive) chemical photoresist on the substrate.

Market Segmentation TYPE

DEVICE WAVELENGTH

APPLICATION

• EUV (Extreme Ultraviolet)

• Mercury Lamps

•

Front End

• DUV (Deep Ultraviolet)

• Fluorine Lamps

•

Back End

• I-line

• Excimer Lasers

• ArF (Argon fluoride)

• Lased Produced Plasma

Base Year

• KrF (Krypton fluoride)

• 370nm-270nm 270nm-170nm • 170nm-1nm

Review Period

2016 – 2019

• ArFi (Argon fluoride immersion)

WAVELENGTH

Year Range

2020 END-USE • IDMs (Integrated Device Manufacturer)

• Foundries

REGION •

North America

•

Europe

•

Asia-Pacific

•

Middle East & Africa

•

South America

Estimated Year

2021 Forecast Period

2022 – 2026

2

Table of Contents S. No.

Contents

1.

Product Overview (Definition of product and major terminologies used in the report)

2.

Research Methodology Detailed description of the methodology used to conduct the research, Raw data backup, list of all secondary sources, List of respondents for primary surveys)

3.

Impact of COVID-19 on Global Photolithography Equipment Market

4.

Executive Summary (This chapter covers summary of the complete study.)

5.

Voice of Customer

6.

Global Photolithography Equipment Market Outlook, 2016-2026F (This chapter includes a brief overview of the product of interest market such as total market’s growth rate, expected growth rate, key growth levers, leading region, top grossing product types, etc. It includes more of a qualitative information about the market.)

6.1.

Market Size & Forecast 6.1.1.

6.2.

6.3.

Page No.

By Value

Market Share & Forecast

6.2.1.

By Type (EUV, DUV, I-line, ArF, ArFi, KrF)

6.2.2.

By Wavelength (370nm-270nm, 270nm-170nm, 170nm-1nm)

6.2.3.

By Device Wavelength (Mercury Lamps, Fluorine Lamps, Excimer Lasers, Lased Produced Plasma)

6.2.4.

By End-Use (IDMs, Foundries)

6.2.5.

By Application (Front End, Back End)

6.2.6.

By Region

6.2.7.

By Company (2020)

Product Market Map

3

Table of Contents S. No. 7.

Contents

Page No.

Asia-Pacific Photolithography Equipment Market Outlook

7.1.

Market Size & Forecast 7.1.1.

7.2.

7.3.

By Value

Market Share & Forecast 7.2.1.

By Type (EUV, DUV, I-line, ArF, ArFi, KrF)

7.2.2.

By Wavelength (370nm-270nm, 270nm-170nm, 170nm-1nm)

7.2.3.

By Device Wavelength (Mercury Lamps, Fluorine Lamps, Excimer Lasers, Lased Produced Plasma)

7.2.4.

By End-Use (IDMs, Foundries)

7.2.5.

By Application (Front End, Back End)

7.2.6.

By Country

Asia-Pacific: Country Analysis 7.3.1.

China Photolithography Equipment Market Outlook 7.3.1.1.

Market Size & Forecast 7.3.1.1.1.

7.3.1.2.

By Value

Market Share & Forecast 7.3.1.2.1.

By Type

7.3.1.2.2.

By Wavelength

7.3.1.2.3.

By Device Wavelength

7.3.1.2.4.

By End User

7.3.1.2.5.

By Application

4

Table of Contents S. No.

Contents 7.3.2.

India Photolithography Equipment Market Outlook 7.3.2.1.

Market Size & Forecast 7.3.2.1.1.

7.3.2.2.

7.3.3.

Page No.

By Value

Market Share & Forecast 7.3.2.2.1.

By Type

7.3.2.2.2.

By Wavelength

7.3.2.2.3.

By Device Wavelength

7.3.2.2.4.

By End User

7.3.2.2.5.

By Application

Singapore Photolithography Equipment Market Outlook 7.3.3.1.

Market Size & Forecast 7.3.3.1.1.

7.3.3.2.

By Value

Market Share & Forecast 7.3.3.2.1.

By Type

7.3.3.2.2.

By Wavelength

7.3.3.2.3.

By Device Wavelength

7.3.3.2.4.

By End User

7.3.3.2.5

By Application

5

Table of Contents S. No.

Contents 7.3.4.

Japan Photolithography Equipment Market Outlook 7.3.4.1.

Market Size & Forecast 7.3.4.1.1.

7.3.4.2.

7.3.5.

Page No.

By Value

Market Share & Forecast 7.3.4.2.1.

By Type

7.3.4.2.2.

By Wavelength

7.3.4.2.3.

By Device Wavelength

7.3.4.2.4.

By End User

7.3.4.2.5.

By Application

South Korea Photolithography Equipment Market Outlook 7.3.5.1.

Market Size & Forecast 7.3.5.1.1.

7.3.5.2.

By Value

Market Share & Forecast 7.3.5.2.1.

By Type

7.3.5.2.2.

By Wavelength

7.3.5.2.3.

By Device Wavelength

7.3.5.2.4.

By End User

7.3.5.2.5.

By Application

6

Table of Contents S. No. 8.

Contents

Page No.

Europe Photolithography Equipment Market Outlook 8.1.

Market Size & Forecast 8.1.1.

8.2.

8.3.

By Value

Market Share & Forecast 8.2.1.

By Type (EUV, DUV, I-line, ArF, ArFi, KrF)

8.2.2.

By Wavelength (370nm-270nm, 270nm-170nm, 170nm-1nm)

8.2.3.

By Device Wavelength (Mercury Lamps, Fluorine Lamps, Excimer Lasers, Lased Produced Plasma)

8.2.4.

By End-Use (IDMs, Foundries)

8.2.5.

By Application (Front End, Back End)

8.2.6.

By Country

Europe: Country Analysis 8.3.1.

France Photolithography Equipment Market Outlook 8.3.1.1.

Market Size & Forecast 8.3.1.1.1.

8.3.1.2.

By Value

Market Share & Forecast 8.3.1.2.1.

By Type

8.3.1.2.2.

By Wavelength

8.3.1.2.3.

By Device Wavelength

8.3.1.2.4.

By End User

8.3.1.2.5.

By Application

7

Table of Contents S. No.

Contents 8.3.2.

Germany Photolithography Equipment Market Outlook 8.3.2.1.

Market Size & Forecast 8.3.2.1.1.

8.3.2.2.

8.3.3.

Page No.

By Value

Market Share & Forecast 8.3.2.2.1.

By Type

8.3.2.2.2.

By Wavelength

8.3.2.2.3.

By Device Wavelength

8.3.2.2.4.

By End User

8.3.2.2.5.

By Application

United Kingdom Photolithography Equipment Market Outlook 8.3.3.1.

Market Size & Forecast 8.3.3.1.1.

8.3.3.2.

By Value

Market Share & Forecast 8.3.3.2.1.

By Type

8.3.3.2.2.

By Wavelength

8.3.3.2.3.

By Device Wavelength

8.3.3.2.4.

By End User

8.3.3.2.5.

By Application

8

Table of Contents S. No.

Contents

8.3.4.

Italy Photolithography Equipment Market Outlook 8.3.4.1.

Market Size & Forecast 8.3.4.1.1.

8.3.4.2.

8.3.5.

Page No.

By Value

Market Share & Forecast 8.3.4.2.1.

By Type

8.3.4.2.2.

By Wavelength

8.3.4.2.3.

By Device Wavelength

8.3.4.2.4.

By End User

8.3.4.2.5.

By Application

Spain Photolithography Equipment Market Outlook 8.3.5.1.

Market Size & Forecast 8.3.5.1.1.

8.3.5.2.

By Value

Market Share & Forecast 8.3.5.2.1.

By Type

8.3.5.2.2.

By Wavelength

8.3.5.2.3.

By Device Wavelength

8.3.5.2.4.

By End User

8.3.5.2.5.

By Application

9

Table of Contents S. No. 9.

Contents

Page No.

North America Photolithography Equipment Market Outlook

9.1.

Market Size & Forecast 9.1.1.

9.2.

9.3.

By Value

Market Share & Forecast 9.2.1.

By Type (EUV, DUV, I-line, ArF, ArFi, KrF)

9.2.2.

By Wavelength (370nm-270nm, 270nm-170nm, 170nm-1nm)

9.2.3.

By Device Wavelength (Mercury Lamps, Fluorine Lamps, Excimer Lasers, Lased Produced Plasma)

9.2.4.

By End-Use (IDMs, Foundries)

9.2.5.

By Application (Front End, Back End)

9.2.6.

By Country

North America: Country Analysis 9.3.1.

United States Photolithography Equipment Market Outlook 9.3.1.1.

Market Size & Forecast 9.3.1.1.1.

9.3.1.2.

By Value

Market Share & Forecast 9.3.1.2.1.

By Type

9.3.1.2.2.

By Wavelength

9.3.1.2.3.

By Device Wavelength

9.3.1.2.4.

By End User

9.3.1.2.5.

By Application

10

Table of Contents S. No.

Contents 9.3.2.

Mexico Photolithography Equipment Market Outlook 9.3.2.1.

Market Size & Forecast 9.3.2.1.1.

9.3.2.2.

9.3.3.

By Value

Market Share & Forecast 9.3.2.2.1.

By Type

9.3.2.2.2.

By Wavelength

9.3.2.2.3.

By Device Wavelength

9.3.2.2.4.

By End User

9.3.2.2.5.

By Application

Canada Photolithography Equipment Market Outlook

9.3.3.1.

Market Size & Forecast 9.3.3.1.1.

9.3.3.2.

10.

Page No.

By Value

Market Share & Forecast 9.3.3.2.1.

By Type

9.3.3.2.2.

By Wavelength

9.3.3.2.3.

By Device Wavelength

9.3.3.2.4.

By End User

9.3.3.2.5.

By Application

South America Photolithography Equipment Market Outlook 10.1.

Market Size & Forecast 10.1.1.

10.2.

By Value

Market Share & Forecast 10.2.1.

By Type (EUV, DUV, I-line, ArF, ArFi, KrF)

11

Table of Contents S. No.

Contents

10.3.

10.2.2.

By Wavelength (370nm-270nm, 270nm-170nm, 170nm-1nm)

10.2.3.

By Device Wavelength (Mercury Lamps, Fluorine Lamps, Excimer Lasers, Lased Produced Plasma)

10.2.4.

By End-Use (IDMs, Foundries)

10.2.5.

By Application (Front End, Back End)

10.2.6.

By Country

Page No.

South America: Country Analysis 10.3.1.

Brazil Photolithography Equipment Market Outlook 10.3.1.1.

Market Size & Forecast 10.3.1.1.1

10.3.1.2.

10.3.2.

By Value

Market Share & Forecast 10.3.1.2.1.

By Type

10.3.1.2.2.

By Wavelength

10.3.1.2.3.

By Device Wavelength

10.3.1.2.4.

By End User

10.3.1.2.5.

By Application

Argentina Photolithography Equipment Market Outlook

10.3.2.1.

Market Size & Forecast 10.3.2.1.1

10.3.2.2.

By Value

Market Share & Forecast 10.3.2.2.1.

By Type

10.3.2.2.2.

By Wavelength

10.3.2.2.3.

By Device Wavelength

10.3.2.2.4.

By End User

12

Table of Contents S. No.

Contents 10.3.2.2.5.

10.3.3.

By Application

Colombia Photolithography Equipment Market Outlook 10.3.3.1.

Market Size & Forecast 10.3.3.1.1

10.3.3.2.

11.

Page No.

By Value

Market Share & Forecast 10.3.3.2.1.

By Type

10.3.2.2.2.

By Wavelength

10.3.2.2.3.

By Device Wavelength

10.3.2.2.4.

By End User

10.3.3.2.5.

By Application

Middle East & Africa Photolithography Equipment Market Outlook 11.1.

Market Size & Forecast

11.1.1.

11.2.

11.3.

By Value

Market Share & Forecast 11.2.1.

By Type (EUV, DUV, I-line, ArF, ArFi, KrF)

11.2.2.

By Wavelength (370nm-270nm, 270nm-170nm, 170nm-1nm)

11.2.3.

By Device Wavelength (Mercury Lamps, Fluorine Lamps, Excimer Lasers, Lased Produced Plasma)

11.2.4.

By End-Use (IDMs, Foundries)

11.2.5.

By Application (Front End, Back End)

11.2.7.

By Country

Middle East & Africa : Country Analysis

13

Table of Contents S. No.

Contents 11.3.1.

South Africa Photolithography Equipment Market Outlook 11.3.1.1.

Market Size & Forecast 11.3.1.1.1.

11.3.1.2.

11.3.2.

By Value

Market Share & Forecast 11.3.1.2.1.

By Type

11.3.1.2.2.

By Wavelength

11.3.1.2.3.

By Device Wavelength

11.3.1.2.4.

By End User

11.3.1.2.5.

By Application

Saudi Arabia Photolithography Equipment Market Outlook 11.3.2.1.

Market Size & Forecast 11.3.2.1.1.

11.3.2.2.

11.3.3.

Page No.

By Value

Market Share & Forecast 11.3.2.2.1.

By Type

11.3.2.2.2.

By Wavelength

11.3.2.2.3.

By Device Wavelength

11.3.2.2.4.

By End User

11.3.2.2.5.

By Application

UAE Photolithography Equipment Market Outlook 11.3.3.1.

Market Size & Forecast 11.3.3.1.1.

By Value

14

Table of Contents S. No.

Contents 11.3.3.2.

12.

Page No.

Market Share & Forecast 11.3.3.2.1.

By Type

11.3.3.2.2.

By Wavelength

11.3.3.2.3.

By Device Wavelength

11.3.3.2.4.

By End User

11.3.3.2.5.

By Application

Market Dynamics (This chapter assesses the major demand drivers and restraints.)

12.1.

Drivers

12.2.

Challenges

13.

Market Trends & Developments (This section captures recent trends pertaining to manufacturing or consumption, market movements in terms of points of production and consumption, advancements and development)

14.

Competitive Landscape 14.1.

Company details

14.2.

Financials (As Reported)

14.3.

Product & Services

14.4.

Key market focus and geographical presence

14.5.

Expansion Strategies

14.6.

Key Management Personnel

15.

Strategic Recommendations (Based on the findings of the report strategic recommendations on how to enter and expand market share)

16.

About Us & Disclaimer

15

RESEARCH METHODOLOGY

Research Methodology

Market Profiling

In-depth secondary research was conducted to determine top players in the global photolithography equipment market, overall market size and segmental market size.

Formulating Questionnaire

In order to conduct industry experts’ interviews, TechSci formulated a detailed discussion guide.

Developing List of Respondents

Data Collection

Data Validation

Data obtained as a result of primary and secondary research was validated through rigorous triangulation.

TechSci conducted interviews with industry experts and industry players for data collection and verification.

List of industry players and industry specialists was developed.

Primary Research

Data Collection

Data Filter & Analysis

Research & Intelligence

Actionable Insights

Business Solution

LinkedIn TechSci Internal Database

✓ Recent Developments ✓ Market Changing Aspects/Dynamics ✓ Government Policies ✓ Final Conclusion

✓ Identifying Key Opinion Leaders ✓ Questionnaire Design ✓ In-depth Interviews

Primary Research ✓ ✓

Desk Research

Secondary Research ✓ ✓ ✓ ✓ ✓ ✓ ✓

Company Websites Company Annual Reports White Paper Study Financial Reports Investor Presentations Regulatory Body Associations, etc.

Data Analysis

The data was scrutinized using MS-Excel, statistical tools and internal proprietary database to obtain qualitative and quantitative insights about the global photolithography equipment market.

Company Analysis ✓ Market Participants ✓ Key Strengths

Paid Sources

✓ ✓

Factiva Hoovers

17

Research Methodology Baseline Methodology

Our dedicated team of industry experts has monitored and analyzed various aspects of the global photolithography equipment market. The team has analyzed the outlook of various segments of this market, while considering the major influencing factors such as growing demand

from the semiconductor market. The study includes market forecasting, which would enable our clients to take better decisions while planning their strategy to achieve sustainability in the global photolithography equipment market.

Methodology Followed for Calculation of Market Size:

•

Market Size By Value: Market size, in terms of Value, for the year 2020 was calculated based on information collected through exhaustive secondary research and primary surveys, with various key opinion leaders/stakeholders, such as as photolithography equipment companies, channel partners, market influencers & end users, industry experts, and other industry participants.

•

The team interviewed more than 15 – 20 as photolithography equipment companies, 45 – 50 channel partners, 80 – 100 end users, and 15 – 20 Industry experts and other Value chain stakeholders in the global photolithography equipment market to obtain the overall market size for 2016-2020, which was validated by the Delphi technique. Taking standard deviation into consideration, the market size was averaged out, to arrive at the market size data during 2016-2020.

18

Research Methodology •

Respondents were asked about the current and future market growth rates, market shares by type, by wavelength, by device wavelength, by end use, by application, by each region and by company. Removing the outlier responses, the geometric mean of growth estimates and supplier wise revenue shares generated across various segments were considered, to arrive at the final revenue shares. Revenue shares generated across various segments were further triangulated from other stakeholders.

Methodology Followed for Calculation of Market Shares: Market shares by type, by wavelength, by device wavelength, by end use, by application, by each region and by company were calculated based on the responses received through primary surveys with industry experts, in which the respondents were asked about the market shares or revenue generated from various segments of global photolithography equipment market. The final shares were calculated by taking the geometric mean of the responses gathered from key opinion leaders after eliminating the outliers.

Methodology Followed for Forecasting: •

TechSci Research performed periodical checks on data collected through the surveys with logic checks and analyzed the survey results in SPSS/Tableau Software.

•

Data triangulation techniques were applied to fill the gaps and to present a more meaningful picture of the market. To forecast global photolithography equipment market, TechSci Research used various forecast techniques such as: ✓

Moving Average

✓

Time Series Analysis

✓

Regression Analysis

✓

Econometric and Judgmental Analysis

19

Research Methodology TechSci Research used its own forecast tool, which is based on the growth of various allied industries in respective regions. TechSci Research also used the impact analysis during short, medium and long term period to estimate the demand and to reach accurate market numbers. It should be noted that the figures compiled are only for the organized market including market share data.

Partial List of Companies Interviewed

Key Secondary Sources

▪ ASML Holding N.V.

▪ World Bank

▪ Canon Inc.

▪ TechSci Research Proprietary Database & Knowledge

▪ Eolith AG

Repository

▪ EV Group

▪ Company Annual Reports

▪ GlobalFoundries Inc.

▪ Industry Magazines ▪ Industry Reports ▪ News Dailies

▪ Credible Paid Databases

20

Industry Brief According to TechSci Research report, “Global Photolithography Equipment Market By Type (EUV (Extreme Ultraviolet), DUV (Deep Ultraviolet), I-line, ArF (Argon fluoride), ArFi (Argon fluoride immersion), KrF (Krypton fluoride)), By Wavelength (370nm-270nm, 270nm-170nm, 170nm-1nm), By Device Wavelength (Mercury Lamps, Flourine Lamps, Excimer Lasers, Lased Produced Plasma), By End-Use (IDMs (Integrated Device Manufacturer), Foundries), By Application (Front End, Back End), By Region, Competition, Forecast & Opportunities, 2026”, Global photolithography equipment market was valued at USD11.26 billion in 2020 and is projected to grow at a CAGR of around 8.56% during the forecast period, owing to the mounting demands of IC chips from the semiconductor industry, budding adoption of digital distribution, high demand from IoT sector, and increased government support for carrying out these advancements.

Additionally, expansion in the demand from the semiconductor market and requirement in the IT and automobile sector is also expected to drive the market. To meet the rising technological demands across the globe, ASML has been a continuous market leader for the past ten years and the company proves to be a boon for the photolithography equipment market on the account of its high reliability. However, high manufacturing and R&D costs and costs for equipment, raw material, maintenance, facilities, and labor charges can hamper the growth of the market. Additionally, market manufacturers rely on raw materials and labor for efficient production so process overheads can further restrict the evolution of the market. The global photolithography equipment market is segmented based on Type, Wavelength, Device Wavelength, End-Use, Application, Region, and Company. Based on region, the market can be fragmented into Asia Pacific, Europe, North America, South America, and Middle East & Africa. Europe contributes the highest share of 35.99% in the market and is expected to grow at a significant pace on account of its high technological ventures’ new user engagement and because of high consumer demands.

Based on wavelength, the market can be divided into 370nm-270nm, 270-170nm,170-1nm. The 170nm-1nm segment dominates the market with a share of 41.27% in 2020, primarily due to its special feature that can implement structures minutely with full accuracy and precision and due to the increasing number of smartphones and PCs, etc., as photolithography is used when it comes to the production of IC chips. Based on device wavelength, the market can be apportioned into Mercury Lamps, Flourine Lamps, Excimer Lasers, Laser Produced Plasma. The Laser produced plasma segment dominates the market with a share of 36.42% in 2020 due to its firing high-intensity beams of light, and because they have been used to create short bursts of x-rays to accelerate particles which are called plasma-based accelerators. Based on end-use, the market can be split up into IDMs, and Foundries. The IDM segment dominates the market with a share of 54.99% in 2020 as they perform both the functions, design as well as manufacture the IC chips. Based on application, the market can be apportioned into Front-end and Back-end. The Front-end segment dominates the market with a share of 51.73% in 2020 because in the frontend type, the construction of the components of the IC is directly done inside the wafer without covering the wafer, which makes the pattern more precise.

ASML, Canon, Nikon, EV Group, Global Foundries, Eulithia AG are some of the leading players which are operating in the global photolithography equipment market. ASML here plays a role of a monopoly market contributing to the highest share of 91.6% in the market with its major customers being Samsung, Intel, and TSMC. ASML has been the key market player for the past 10 years and is expected to lead the market in the future as well on account of its high reliability and importer satisfaction. These companies are launching highly reliable, photolithography techniques with progressive instruction sets, technologically advanced light beam techniques with high frequency, accuracy, and precision. The companies operating in the market are using organic strategies such as new product launches and merges & collaborations to boost their shares in the market and meet consumer demands.

“Global photolithography equipment market is anticipated to grow at a significant pace during the forecast period due to the increasing technological advancements, new customer engagement, need of semiconductor IC chips in numerous sectors, increased government investments for photolithography equipment.”, said Mr. Karan Chechi, Research Director with TechSci Research, a research based global management consulting firm.

21

Sample Data - Snapshot Global Photolithography Equipment Market Size, By Value (USD Million), 2016–2026F

5.00

2016

6.00

7.00

8.00

CAGR By Value

XX%

9.00

10.00

2020

2021E

11.00

15.00

2026F

CAGR By Value

YY%

2016 2020

14.00

13.00

12.00

2021E 2026F

Europe Photolithography Equipment Market Share, By Type, By Value, 2016–2026F EUV DUV I-line ArF ArFi 2026F 2025F 2024F 2023F 2022F 2021E 2020 2019 2018 2017 2016

25% 25% 25% 25% 25% 25% 25% 25% 25% 25% 25%

25% 25% 25% 25% 25% 25% 25% 25% 25% 25% 25%

10% 10% 10% 10% 10% 10% 10% 10% 10% 10% 10%

20% 20% 20% 20% 20% 20% 20% 20% 20% 20% 20%

KrF 10% 10% 10% 10% 10% 10% 10% 10% 10% 10% 10%

10% 10% 10% 10% 10% 10% 10% 10% 10% 10% 10%

Germany Photolithography Equipment Market Share, By Wavelength, By Value, 2016–2026F 370nm-270nm 2026F 2025F 2024F 2023F 2022F 2021E 2020 2019 2018 2017 2016

30% 30% 30% 30% 30% 30% 30% 30% 30% 30% 30%

270nm-170nm 40% 40% 40% 40% 40% 40% 40% 40% 40% 40% 40%

170nm-1nm 30% 30% 30% 30% 30% 30% 30% 30% 30% 30% 30%

22

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Report Name: GLOBAL PHOTOLITHOGRAPHY EQUIPMENT MARKET FORECAST & OPPORTUNITIES 2016 – 2026

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About Us & Disclaimer

TechSci Research is a global market research and consulting company with offices in the US, UK and India. TechSci Research provides market research reports in number of areas to organizations. The company uses innovative business models that focus on improving productivity, while ensuring creation of high-quality reports. The

proprietary forecasting models use various analyses of both industry-specific and macroeconomic variables on a state-by-state basis to produce a unique ‘bottom-up’ model of a country, regional and global industry prospects. Combined with the detailed analysis of company activity and industry trends, the result is a uniquely rich evaluation of the opportunities available in the market.

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