Harvard’s CNS to Install the World’s Fastest EBL System
Harvard’s Center for Nanoscale Systems(CNS) will install North America’s first High Speed Elionix ELS-HS50 electron beam lithography system. This will be the third Elionix electron beam lithography system installed into the Harvard CNS cleanroom. The new Elionix ELS-HS50 has been significantly enhanced to improve throughput, as compared to conventional electron beam lithography systems. The Elionix ELS-HS50 is the world’s fastest direct write Electron Beam Lithography system. Dr. William Wilson, the Director of Harvard’s Center for Nanoscale Systems states: “We are extremely excited about the addition of this new high-speed tool. We believe this new system will dramatically impact our prototyping bandwidth for advanced photonic and quantum devices, enhancing the creativity of our Science and Engineering teams.”