Sputtering Target Material for Semiconductor Market
Sputtering Target Material for Semiconductor
Market Scope: Industry Analysis, Market Size, Growth, Trends Till 2031
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Sputtering Target Material for Semiconductor Market Size and Growth
The global Sputtering Target Material for Semiconductor market is projected to reach a value of $X billion by 2025, growing at a CAGR of X% during the forecast period. The market is driven by increasing demand for electronic devices, advancements in semiconductor technology, and growing investments in R&D.
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Companies Covered (Covid 19 Impact Covered)
◍ JX Nippon Mining & Metals Corporation
◍ Praxair
◍ Plansee SE
◍ Mitsui Mining & Smelting
◍ Hitachi Metals
◍ Honeywell
◍ Sumitomo Chemical
◍ ULVAC
◍ Materion (Heraeus)
◍ GRIKIN Advanced Material Co., Ltd.
◍ TOSOH
◍ Ningbo Jiangfeng
◍ Heesung
◍ Luvata
◍ Fujian Acetron New Materials Co., Ltd
◍ Changzhou Sujing Electronic Material
◍ Luoyang Sifon Electronic Materials
The competitive landscape of the Sputtering Target Material for Semiconductor Market includes companies like JX Nippon Mining & Metals Corporation, Praxair, Plansee SE, Mitsui Mining & Smelting, Hitachi Metals, Honeywell and others. These companies provide highquality sputtering target materials to semiconductor manufacturers, driving growth in the market.
- JX Nippon Mining & Metals Corporation: $8.5 billion in sales revenue
- Praxair: $11.3 billion in sales revenue
- Mitsui Mining & Smelting: $4.2 billion in sales revenue
◍ FURAYA Metals Co., Ltd
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Market Segmentation
By Application
◍ Analog IC
◍ Digital IC
◍ Analog/Digital IC
By Product
◍ Metal Sputtering Target Material
◍ Alloy Sputtering Target Material
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$ X Billion USD
Market Growth
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