High Purity Metal Sputtering Target Market
High Purity Metal Sputtering Target Market Scope:
Industry Analysis, Market Size, Growth, Trends Till 2031
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High Purity Metal Sputtering Target Market Size and Growth
The High Purity Metal Sputtering Target market is witnessing significant growth, driven by increased demand in electronics and advanced materials. Current market size estimates exceed $1 billion, with a projected CAGR of around 5% over the next five years. Key trends include technological advancements and rising applications in solar and semiconductor industries.
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Companies Covered
(Covid 19 Impact Covered)
◍ Materion (Heraeus)
◍ JX Nippon Mining & Metals Corporation
◍ Praxair
◍ Plansee SE
◍ Hitachi Metals
◍ Honeywell
◍ Mitsui Mining & Smelting
◍ Sumitomo Chemical
◍ ULVAC
◍ TOSOH
◍ Ningbo Jiangfeng
◍ Heesung
◍ Luvata
◍ Fujian Acetron New Materials
◍ Changzhou Sujing Electronic Material
◍ Luoyang Sifon Electronic Materials
◍ GRIKIN Advanced Material
◍ FURAYA Metals
The High Purity Metal Sputtering Target Market is competitive, with key players like Materion, JX Nippon, and Praxair driving innovation and quality. These companies supply essential materials for electronics and semiconductor applications, enhancing market growth. Notable revenues include: Materion (~$1 billion), and Hitachi Metals ($5 billion).
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Market Segmentation
By Application
Semiconductor
Solar Energy
Flat Panel Display
Others
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By Product
Metal Target
Alloy Target
Market Growth
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$ X Billion USD
