High-Precision Motion Control Within Nano-Metric Range

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High-Precision Motion Control Within Nano-Metric Range - Ideal For Wafer Handling Systems

To design perfect systems for wafer alignment, testing, and positioning in a quality control phase, the wafer stages program is designed ideally with high precision motion control within the nanometer range. The precision motion control system in wafer handling equipment assures high accuracy with a 1 – 5 nanometer resolution along with slow constant motion which is greater than or equal to 50 nm per second. In order to improve the dynamic performance special servo motors and ironless linear and torque motors are used. Highly precise linear conductors reduce juddering. Adding of pneumatic subsystem completes the robotics array. Smoother and even motion sequences are produced with higher-order motion profiles and spline functions.

Design Freedom With The Help Of Precision Motion Control: To avail an exceptional design freedom, the precision motion control system is based on the embedded control YM which permits for the same. In this, next-gen hardware is designed to manage and run


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