A NOVEL MULTIPLIER DESIGN USING ADAPTIVE HOLD LOGIC TO MITIGATE BTI EFFECT

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GRD Journals | Global Research and Development Journal for Engineering | International Conference on Innovations in Engineering and Technology (ICIET) - 2016 | July 2016

e-ISSN: 2455-5703

A Novel Multiplier Design using Adaptive Hold Logic to Mitigate BTI Effect 1A.

Gopivignesh 2P. N. Sundararajan 1 PG Student 2Associate Professor 1,2 Department of Electronics and communication Engineering 1,2 PSNA College of Engineering and Technology, Tamil Nadu, India Abstract The overall performance of a system depends on the performance of the multipliers, thus digital multipliers are among the most critical arithmetic functional units; but their performance is affected by negative bias temperature instability effect and positive bias temperature instability effect. The negative bias temperature instability effect occurs when a pMOS transistor is under negative bias (Vgs =−Vdd), increasing the threshold voltage of the pMOS transistor, and reducing multiplier speed. A similar phenomenon, positive bias temperature instability, occurs when an nMOS transistor is under positive bias. Both these effects degrade transistor speed, and in the long term, the system may fail due to timing violations. Therefore this paper proposes an aging-aware multiplier design with a new adaptive hold logic (AHL) circuit. To mitigate performance degradation due to the aging effect, this architecture can be applied to a column- bypassing multiplier or row-bypassing multiplier. Keyword- Adaptive hold logic (AHL), negative bias temperature instability (NBTI), positive bias temperature instability (PBTI), reliable multiplier, variable latency __________________________________________________________________________________________________

I. INTRODUCTION A novel multiplier design using adaptive hold logic to mitigate bti effect Digital multipliers are among the most critical arithmetic functional units in many applications, such as the Fourier transform, discrete cosine transforms, and digital filtering. The through put of these applications depends on multipliers, and if the multipliers are too slow, the performance of entire circuits will be reduced. Furthermore, negative bias temperature instability (NBTI) occurs when a pMOS transistor is under negative bias (Vgs = −Vdd). In this situation, the interaction between inversion layer holes and hydrogen-passivated Si atoms breaks the Si–H bond generated during the oxidation process, generating H or H2 molecules. When these molecules diffuse away, interface traps are left. The accumulated interface traps between silicon and the gate oxide interface result in increased threshold voltage (Vth), reducing the circuit switching speed. When the biased voltage is removed, the reverse reaction occurs, reducing the NBTI effect. However, the reverse reaction does not eliminate all the interface traps generated during the stress phase, and Vth is increased in the long term. Hence, it is important to design a reliable high-performance multiplier. The corresponding effect on an nMOS transistor is positive bias temperature instability (PBTI), which occurs when an nMOS transistor is under positive bias. Compared with the NBTI effect, the PBTI effect is much smaller on oxide/polygate transistors, and therefore is usually ignored.

II. RELATED WORK A. Threshold voltage instabilities in high-k gate dielectric stacks Author: S. Zafar, A. Kuma Year: Mar. 2005 Over recent years, there has been increasing research and development efforts to replace SiO2 with high dielectric constant (high-κ) materials such as HfO2, HfSiO, and Al2O3. An important transistor reliability issue is the threshold voltage stability under prolonged stressing. In these materials, threshold voltage is observed to shift with stressing time and conditions, thereby giving rise to threshold voltage instabilities. In this paper, we review various causes of threshold voltage instability: charge trapping under positive bias stressing, positive charge creation under negative bias stressing (NBTI), hot-carrier stressing, detrapping and transient charge trapping effects in high-κ gate dielectric stacks. B. Impacts of NBTI/PBTI on timing control circuits and degradation tolerant design in nanoscale CMOS SRAM Author: H.-I. Yang, S.-C. Yang Year: Jun. 2011

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