Eva bak 761 web

2000 501 641 701

The industry standard

BAK 761 901 1101 1250 1401

BAK 761

Platform summary Install up to three e guns Manual loading or “cassette to cassette” Standard or extended throw

The BAK 761 is the workhorse for optics, optoelectronics and semiconductor applications.

600

1. Choose your chamber geometry Standard Throw - for typical metals and dielectrics depostion Extended Throw - for “lift off” Split Chamber - for reactive materials Extended rear for custom dep & etch requirements

2100

1300

Split chamber and load lock variants

2. Choose your Sources Typical Layout

EBS electron beam guns (up to 3) A wide range of thermal sources Barrel sources and effusion cells Ion and plasma sources for PIAD or etch Back & front side heating Linear and round sputter cathodes

1900 2100

1200

1300

3300

3. Choose your tooling Dome as standard Additional options for:-- Flip systems -- Planetary -- Custom designs 4. Choose your process control 600

Khan system & process controller as standard Additional options for:-- Quartz or optical monitoring layer termination -- Optical pyrometry - temperature control

Substrate size 3” 4” 5” 6” 8”

Substrate handling 4 segments 64 40 20 16 8

Evatec Ltd. Lochrietstrasse 14 CH-8890 Flums Switzerland

3 segments 54 39 24 18 6

Knudsen 123 78 48 33 15

Tel: + 41 81 720 1080 Fax: + 41 81 720 1081 info@evatecnet.com www.evatecnet.com

Product descriptions, photos and data are supplied within the brochure for general information only and may be superseded by any data contained within Evatec quotations, manuals or specifications.