Eva bak 641 web

1250 1401 2000 501

The compact production workhorse

BAK 641 701 761 901 1101

BAK 641

Platform summary Low materials utilization

Select a BAK641, and you can be sure of a proven production workhorse for precision optics, optoelectronics and semiconductor applications.

Production on substrate sizes up to 8 inch Space for multiple sources and process accessories

1. Choose your chamber geometry

800

2100

Standard Throw - for typical metals and dielectrics depostion Extended Throw - for “lift off” Split Chamber - for reactive materials Extended rear for custom dep & etch requirements 2. Choose your Sources

Typical Layout

EBS electron beam guns A wide range of thermal sources Barrel sources and effusion cells Ion and plasma sources for PIAD or etch Back & front side heating Linear and round sputter cathodes

1800 2000

900

2300

500

1000

1800

3. Choose your tooling

1300

Substrate size

Capacity (standard dome)

2” 3” 4” 5” 6” 8”

78 33 24 18 9 6

Evatec Ltd. Lochrietstrasse 14 CH-8890 Flums Switzerland

Tel: + 41 81 720 1080 Fax: + 41 81 720 1081 info@evatecnet.com www.evatecnet.com

Dome as standard Additional options for:-- Flip systems -- Planetary -- Custom designs 4. Choose your process control Khan system & process controller as standard Additional options for:-- Quartz or optical monitoring layer termination -- Optical pyrometry - temperature control

Product descriptions, photos and data are supplied within the brochure for general information only and may be superseded by any data contained within Evatec quotations, manuals or specifications.