Explore About Varied Forms of Plasma Ashers and their Industrial Applications

Explore About Varied Forms of Plasma Ashers and their Industrial Applications The plasma technology is touching human lives in many respects these days. For instance, in many industrial processes, plasma products are being used to make an object’s surface clean by removing its photoresists, light particles, and modifying properties of surface as well. There are some significant plasma processes are carried out in industries for making necessary changes on surfaces such as surface cleaning, surface coating, surface modification, surface etching, surface activation and so on. To carry out all such plasma process on the surface, there are specially designed plasma products or chambers are used in industries too. For instance, plasma ahers are widely used plasma products, which are commonly utilized during plasma ashing process that involves removal of photoresist or light sensitive coating on the surface of semiconductor wafers.

What is Plasma Asher?

Plasma ashers are commonly used in semiconductor process that involves removal of light sensitive coatings on the surface of etched wafers. These plasma

products are designed specically to carry out removal of photo resist or etched particles on semiconductor wafers and make its surface effective for intended purpose. The whole process is so called as plasma ashing process and the plasma product used in this process is known as plasma chamber in which varied gases are introduced to produce high energy by passing through an array of electrodes present in the chamber.

Types of Plasma Ashing Generally, there are two types of plasma ashing are used in the semiconductor process of removing photo resist on wafer surface such as plasma. Both types may vary in terms of temperature difference, in which one is carried out at High temperature or called as stripping. The second one is performed in order to remove photo resist on wafer surface and is termed as “Descum� process.

Both the forms of plasma ashing are applied on wafers during semiconductor process. The main difference between both processes is in terms of temperature, when it is exposed on the wafer in a closed plasma chamber during process. Apart from that, there are some more forms of plasma ashers are used such as ICP

ashers and downstream ashers. Both forms of plasma ashing do have their own significance and are used at industries in diverse plasma ashing and etching processes.

What is ICP Asher?

ICP asher or Inductive Coupled Plasma asher is type of plasma source that is used to energize electric circuits, which are generated by electromagnetic induction process. The ICP works progressively to produce energy that may vary between ranges 6000 to 10,000 K. The high temperature ICP source converts the atoms into ion samples.

What is Downstream Ashers?

The downstream plasma etch process is a commonly known as “plasma cleaner� process, which is revolutionized in terms of eliminating carbon and hydrocarbon contents from surface. The whole process is carried out in a closed plasma chamber.

Thus, above are some standard forms of plasma ashing processes carried out in diverse industries for treating wafers or other substances. So, if you are also looking for the best quality plasma chambers and ashers for your industrial applications, you should contact to the leading plasma products suppliers in Singapore. On their websites, you will find details of various types of plasma ashing process products or chambers, which are great applications in diverse plasma processes and tests to be performed at industrial level. So, you can compare specifications of require plasma products online at websites of trusted suppliers in Singapore and place the order for desired online wisely.

The price ranges of industrial plasma products or chambers are also reasonable at genuine suppliers in Singapore. But, it is recommended buying such plasma ashers products online through websites of verified suppliers in Singapore only.

Original Article: Explore About Varied Forms of Plasma Ashers