The global Wafer OCD Measurement System Market was valued at 1033 million in 2024 and is projected to reach US$ 1810 million by 2032, at a CAGR of 8.6% during the forecast period
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• The global Wafer OCD Measurement System Market was valued at 1033 million in 2024 and is projected to reach US$ 1810 million by 2032, at a CAGR of 8.6% during the forecast period.
• Wafer OCD (Optical Critical Dimension) measurement systems are precision instruments used in semiconductor manufacturing to detect and analyze defects at nanometer-scale dimensions throughout the production process. These systems utilize advanced optical technologies to measure critical parameters such as film thickness, line width, and pattern profiles, ensuring higher yield and quality control in chip fabrication. The increasing complexity of semiconductor nodes, particularly in the transition to sub-7nm technologies, has heightened demand for these systems.
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By Type:
• The market is segmented based on type into:
• Technical Nodes Of 32nm and Below
• 2Xnm Technology Node
• 1Xnm Technology Node
• 7nm, 5nm Or Higher Technical Nodes
By Application:
• The market is segmented based on application into:
• 200mm Wafer
• 300mm Wafer
• Other
• KLA Corporation (U.S.)
• Onto Innovation (U.S.)
• NOVA (Israel)
• Nanotronics (U.S.)
• Nanometrics (U.S.) – Merged into Onto Innovation
• Shanghai RSIC (China)
• Shanghai Precision Measurement (China)
• Shenzhen Angstrom Excellence (China)
