MARKET OVERVIEW
A sputtering target for semiconductors is a high-purity material used in the sputtering process, a form of physical vapor deposition (PVD), to create thin films on semiconductor wafers. These thin films are essential in the manufacturing of integrated circuits (ICs) and other semiconductor devices. During the sputtering process, high-energy particles (typically ions) bombard the target material, causing its atoms or molecules to be ejected and deposited onto the wafer.
MARKET SIZE & GROWTH
• The global Sputtering Target for Semiconductor Market was valued at $2,003 million in 2024.
• It is projected to reach $3,259 million by 2031.
• The market is expected to grow at a CAGR of 7.4% during the forecast period.
