Report Overview:
Semiconductor ion implanter is the key equipment in the pre manufacturing process of integrated circuit. Ion implantation is the technology of doping the area near the semiconductor surface, which aims to change the carrier concentration and conductivity type of semiconductor.
Compared with the conventional hot doping process, ion implantation can precisely control the implantation dose, implantation angle, implantation depth and lateral diffusion, overcome the limitations of conventional process, improve the integration, opening speed, yield and life of the circuit, and reduce the cost and power consumption. Ion implanter is widely used in doping process, which can meet the requirements of shallow junction, low temperature and precise control. It has become an essential key equipment in IC manufacturing process.
Market Value:
The global Semiconductor Ion Implanter market size was valued at US$ 1.23 billion in 2024 and is projected to reach US$ 1.67 billion by 2030, at a CAGR of 5.2% during the forecast period 2024-2030.
CAGR of 5.2%
(2024-2030)
