Report Overview
A Multi-beam Mask Writer is a type of lithography tool used in the semiconductor industry for writing patterns on masks (or reticles) for subsequent use in the photolithography process. Unlike conventional lithography, which uses a single, focused beam of light to expose patterns on a substrate, a Multi-beam Mask Writer uses multiple beams of electrons to expose patterns on a photomask, allowing for faster and more efficient pattern writing. These tools are typically used in the production of advanced semiconductor devices and other highprecision microelectronics.
