CAGR Value:
CMP Slurry Monitoring Market size was valued at US$ 183.4 million in 2024 and is projected to reach US$ 326.7 million by 2032, at a CAGR of 8.5% during the forecast period 2025-2032
Report Studies
• The global CMP Slurry Monitoring Market size was valued at US$ 183.4 million in 2024 and is projected to reach US$ 326.7 million by 2032, at a CAGR of 8.5% during the forecast period 2025-2032. The U.S. market is estimated at USD 92.4 million in 2024, while China is expected to grow at a faster pace reaching USD 134.6 million by 2032.
• CMP (Chemical Mechanical Planarization) slurry monitoring systems are critical quality control solutions used in semiconductor manufacturing to analyze and maintain slurry properties. These systems measure key parameters including Large Particle Counts (LPC), density, viscosity, pH levels, and particle size distribution to ensure optimal polishing performance. The technology plays a vital role in improving wafer yield and reducing defects in advanced node semiconductor production.
By Type:
• The market is segmented based on type into:
• Large Particle Counts (LPC)
• Subtypes: In-line sensors and off-line analyzers
• Density
• Viscosity
• Others
• The market is segmented based on application into:
• Integrated Circuit
• Semiconductor Manufacturing
• Others
• ENTEGRIS, INC (U.S.)
• Rheonics (Switzerland)
• Colloidal Dynamics LLC (U.S.)
• HORIBA (Japan)
• Entegris (U.S.)
• Spheryx, Inc. (U.S.)
• Applied Analytics, Inc. (U.S.)
