Program day 3 Friday 15th morning Process and Process Modelling II
Chair: L. Montelius (Øresund University & Øresund Science Region) 9:00 – 9:30
H. Hiroshima
UV-NIL Research for 20 nm Level ULSI Manufacturing (invited)
9:30 – 9:45
H. Taylor
Chip-Scale Simulation of Residual Layer Thickness Uniformity in Thermal Nanoimprint Lithography: Evaluating Stamp Cavity-Height and “Dummy-Fill” Selection Strategies
9:45 –10:00
D. Mendels
Mechanical proximity correction using the NIL Simulation Suite
Industrial implementations / Applications II Chair: to be announced 10:30 – 11:00
L. Chen
Commercial applications of roll-to-roll nanoimprinting and large area holographic patterns (invited)
11:00 – 11:15
Roll-To-Roll Nanoimprinted Backlight Devices
11:15 – 11:30
T Mäkela H. Mekaru
11:30 – 11:45
Y-C. Lee
Direct Metal Contact Printing Lithography for Patterning Sapphire Substrate and Enhancing Light Extraction Efficiency of Light-Emitting Diodes
11:45 -.12:00
C. Wang
Light Extraction Efficiency Improvement of Blue GaN Light Emitting Diode Using Nanoimprinted Pattern on Sapphire Substrate
Roller Imprint System Combined with Reel-To-Reel Feeding Device
Friday 15th afternoon Applications III
Chair: M Hornung (SÜSS MicroTec Lithography GmbH) 13:30 – 14:00
M. Re
Nanoimprint and bit patterned media (invited)
14:00 – 14:15
M. Mikkelsen
All-silica nanofluidic devices for DNA-analysis fabricated by nanoimprint of sol-gel with hard stamp
A. Schleunitz
3-D Nanoimprint Stamp Fabrication by Dose-Modulated Electron-Beam Lithography, Thermal Annealing and Proportional Pattern Transfer
E. Rognin
Viscosity measurements of thin polymer films from reflow of NanoImprinted patterns
14:45 – 15:00
S. Howitz
Fabrication of nanoliter and picoliter-sized wells in SU-8 and NOA utilizing UV imprint technology on the GeSiM μ-CP platform
14:15 – 14:30
14:30 – 14:45
Summary
Chair: C. M. Sotomayor Torres (Catalan Institute of Nanotechnology) 15:30 – 15:50 15:50 – 16:10 16:10 – 16:30
16:30 – 17:00
H. Schift
Materials / Stamps
S. Matsui
Metrology / Standards
(to be anounced) L. Montelius / C. SotomayorTorres
Processes / Modelling
Wrap up and Announcement NNT2011
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