Product News Archer 100 Advanced optical overlay metrology for ≤45nm design rules Archer 100 Benefits Significantly reduces TMU to satisfy tighter overlay error budgets for ≤45nm design rules Enabling technology for nextgeneration immersion and double patterning lithography Improved tool utilization and CoO increases productivity by 20% over previous generation Micro-grating (µAIMTM) targets increase process robustness and higher-order overlay control Enhances measurement of lowcontrast targets; especially benefits HVM memory applications
Pattern-limited yield is a key challenge for semiconductor manufacturers at the 45nm node and below due to tighter process tolerances and increasing chip density. Overlay is especially critical, because as error budgets continue to shrink below 30% of design rules, existing overlay tools can no longer meet current total measurement uncertainty (TMU) requirements. The Archer™ 100 overlay control system, based on the industry proven Archer platform, meets stringent performance and cost of ownership (CoO) requirements for ≤45nm design rules. Redesigned optics (better SbS matching), tighter stage tolerances (higher repeatability), new imaging system (improved SNR, lower pixel distortion), and advanced illumination modes (reduced tool induced shift) combine to improve TMU specifications by more than 30% over existing tools. These features, along with the shorter MAM time, enhanced algorithms and built-in diagnostics deliver the high levels of process robustness and productivity needed to overcome tighter overlay error budgets. Leveraging KLA-Tencor’s patented AIM™ technology and Archer Analyzer™ software, the Archer 100 enables in-field metrology and analysis for advance dispositioning and higher-order overlay control. A new recipe optimization methodology (ARO) enables relatively unskilled operators to quickly and automatically create high quality recipes offline, thus freeing up valuable engineering resources and improving ease of use and overall tool utilization. Especially useful for immersion lithography, new micro-grating overlay technology – leveraged on the Archer 100 together with Archer Analyzer – provides accurate, robust measurements, helping to minimize overlay model residuals and achieve higher order overlay control. Questions about how the Archer 100 can address a specific use case or challenge? Please contact Eitan Herzel at eitan.herzel@kla-tencor.com
Automatic Recipe Optimizer (ARO) enables faster, easier recipe creation and optimization Recipe Database Manager
Archer 100
ARO
ARO
ARO
ARO
(RDM+) reduces setup time, and increases reliability, recipe success rate and traceability of
Host
Remote Client
RDM+
measurement recipes
ARC
Remote Client
The new RDM+ software enables offline access to a centralized database to leverage previously proven recipe components. The waferless, imageless, and Automation Recipe Creation (ARC) modes enable full automation of the recipe creation process across all KLA-Tencor overlay metrology systems.
www.kla-tencor.com/ymsmagazine
Wafer lot dispositioning and stepper correction data from Archer Analyzer helps lithographers to reduce rework and yield loss.
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