C2MGZN september 2018

CONTAMINATION CONTROL MAGAZINE | UITGAVE VAN VCCN | JAARGANG 31 | EDITIE 3-2018

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ISCC’18 INTERNATIONAL SYMPOSIUM ON CONTAMINATION CONTROL THE NETHERLANDS, THE HAGUE 23 - 26 SEPTEMBER 2018

special edition

WE SHARE THE KNOWLEDGE Vereniging Contamination Control Nederland

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ISCC'18 OPENING ISCC’18 SYMPOSIUM IN LESS THAN FOUR WEEKS! While Dutch summer keeps its hot and sunny days coming, temperatures continue to rise in the VCCN ISCC’18 organizing team.

This special ISCC’18 magazine provides all the information you need before hundreds of contamination control experts gather on September 23rd – 26rd for the ISCC’18 symposium at the World Forum in The Hague.

Knowledge development and knowledge sharing are the cornerstones of our associations. With this in mind the scientific committee has put together a programme that matches the interest of both senior and junior contamination control professionals. Have a close look at our symposium programme that includes more than 80 speaker sessions, workshops and tutorials. Good preparation ensures that you make the most of your participation.

The start of the programme on September 24th will be a special ceremony that takes you into “The world behind contamination control”.

So be sure you are on time in the World Forum in The Hague.

KEYNOTE SPEAKERS During the congress, four prominent keynote speakers will fill you in on the latest developments in their field. Hear everything about nanotechnology by Dave Blank, micro biology by Bas Zaat, extreme ultraviolet lithography by Vadim Banine and learn all about the developments and expectations for the near future by Peter Ros.

A wide range of international companies looks forward to showing you their latest innovations at their stands. Furthermore our next generation of contamination control experts will be represented at the symposium by the Technasium; a Dutch network of high schools dedicated to encouraging students to choose science and technology oriented education.

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I look forward seeing you at the ISCC’18.

HOW TO SELECT THE CLEANROOM STANDARDS YOU NEED ICCCS-ISO This year at the ICCCS symposium ISCC 2018 there will be several occasions, during presentations, tutorials, workshops and meetings to discuss the need and use of the ISO 14644 and 14698 cleanroom standards.

Eric Stuiver Chairman VCCN

Ir. Koos Agricola

06

CONTENT DEMONSTRATORSmer

During ISCC'18 you can attend interesting presentations.

Meet the people and companies involved in printed flexible electronics on paper, photonic integrated circuits, nanoparticles at the push of a button, in air microfluidics, lab on a chip, and sunsensors for space and terrestrial applications.

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PREFACE Preface by Eric Stuiver

06

SELECTING CLEANROOM STANDARDS How to select the standards you need?

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NANOTECHNOLOGY Keynote speaker Dave Blank

12

MICROBIOLOGY Keynote speaker Bas Zaat

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EXTREME ULTRAVIOLET LITHOGRAPHY Keynote speaker Vadim Banine

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A PREVIEW OF THE FUTURE Keynote speaker Peter Ros

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PROGRAMME SUNDAY-WEDNESDAY Timetable for all days

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SPOTLIGHT ON MONDAY Timetable and programme for Monday 24th September

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SPOTLIGHT ON TUESDAY & WEDNESDAY Timetable and programme for Tuesday 25th September and Wednesday 26th september EXHIBITORS Alphabetic overview of the exhibitors DEMONSTRATORS

28 Overview of demonstrators WORKSHOPS & TUTORIALS Improve your skills and knowledge during the many practical workshops and tutorials. There is a wide offer in the field of designing cleanrooms, cleaning (including procedure development ) and cleanroom behavior. In addition, you can learn about the impact of nanoelectronics, the monitoring of particle deposition and various new guidelines.

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WORKSHOPS & TUTORIALS Programme for workshops and tutorials on Monday and Tuesday TECHNASIUM Students will be linked to your company's case to look at it from a fresh angle CLEAN RUMOURS Dusty & Bacter are concerned

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COLOPHON Editors and contact

30 32

Contamination Control Magazine volume 3-2018

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SELECTINGSTANDARDS How to select the cleanroom standards you need.

ICCCS – ISO Cleanroom standards cooperation.

Ir. Koos Agricola NEN/VCCN delegate ISO TC 209 and CEN TC243

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Every two years the ICCCS symposium provides a good opportunity for the interaction between the experts that write new cleanroom standards and the people that use these standards. The cooperation between the ICCCS and the ISO 209 is such that meetings are aligned and hot topics are discussed within the ICCCS symposia. This year at the ICCCS symposium ISCC 2018 there will be several occasions, during presentations, tutorials, workshops and meetings to discuss the need and use of the ISO 14644 and 14698 cleanroom standards.

A risk based

approach

is the best way to select the

“

standards

of interest

Cleanroom standards Initially cleanroom standards focussed on establishing and operating cleanrooms with a specific cleanroom class. Slowly a cleanroom has become a required facility, necessary to carry out contamination control.

The applications of cleanroom technology expanded and other contaminants apart from particles are addressed. These other contaminants are chemical and nanosized particles. The viable particles or micro-organisms are addressed in separate sets of standards, using risk assessment as the leading theme. Cleanrooms are used to keep vulnerable surfaces clean. So new standards on surface cleanliness and ways to achieve a particular surface cleanliness level, had to be made.

To create a clean, controlled environment it is important to determine the source strength of people, garments, consumables and equipment.

Therefore a standard measurement method and a normative way of expressing and applying emission data were described.

By finetuning the amount of clean air and the people, equipment and materials in the cleanroom the over specification of air volume can be prevented. This effort will help to reduce the required energy. In a new standard, various ways of reducing energy use are described.

Since the focus has been on air cleanliness that can by measured by light scattering particle counters, the impact of particles that cannot be removed effectively by air flow was almost neglected. The particles that cannot be removed deposit on surfaces.

In applications such as optics, space industry and displays, the deposition of macro-particles is very important. Macro-particles are also the main microbe carrying particles (mcp’s) and therefore the deposition rate of mcp’s is important in applications such as medical devices and hospitals. Measurement methods for the determination of the particle deposition rate have been known for decades, but these are labour intensive. New instrumentation makes the measurement more accessible and so there is a need for a standard on particle deposition rate application.

Due to the increase of all these cleanroom standards (see overview at the end of this article) a different approach has to be developed as to how to use these standards. Since cleanrooms are used to limit and control unwanted contamination of products, processes and patients, a risk based approach is

the best way to select the standards of interest. The risk based approach was already introduced in the standards on biocontamination and recently in the standards on monitoring air cleanliness with respect to particles.

Risk assessment A risk assessment is applied to determine the type of unwanted contaminants. For the setting of requirements it is worthwhile to determine the acceptable and unacceptable level of contamination.

In a product, surface cleanliness is important.

Looking at the functions of the product the critical surface(s) within the product can be determined.

By investigating the concentration, size and/or type of contamination the maximum acceptable concentration can be determined.

From this the final surface cleanliness can be determined. When the critical surface is exposed it can be contaminated by deposition and contact transfer. The amount of acceptable deposition and contact transfer is determined by the difference between the final surface cleanliness and the initial surface cleanliness.

The acceptable amount of deposition, the time of exposure and the critical surface area determine the contaminant deposition rate. From this information the required air cleanliness level can be derived.

The acceptable contact transfer, number of contacts and contact area within the critical surface area determine the maximum contaminant surface concentration of the contact surface. From this information the required surface cleanliness levels can be derived.

In some applications the product approach cannot be used, instead cleanliness levels of the environment (air and surrounding surfaces) are determined. This is often applied in biocontamination, but when looking at hospitals, the critical wound area of a patient can be treated in a similar way to a product.

Setting requirements From the risk assessment the contaminants and the acceptable and unacceptable contamination levels at critical location are derived. Sometimes additional details of the unwanted contaminants are important.

This could be the electrical conductivity of particles or a specific type of micro-organism. In those cases a fraction or all particles or micro-organisms are considered to be unwanted.

Contamination Control Magazine volume 3-2018

7

SELECTING STANDARDS -continuationUse of cleanroom standards Risk Assessment

Critical contaminants

Particles

number, size

Viables

number, type

Nanoscal particles

number, size

Chemicals

mass, type

Critical surfaces Critical environment Setting requirments and measurment methods Contaminans

Surface

Air

Particles

14644-9

14644-1,3

Viables

14698-1

14698-1

NA

14644-12

14644-10

14644-9

Nanoscal particles Chemicals

Establish control Design

Construction Verification

cleanroom

14644-4,7,16

sources

14644-14,15,18

procedures

14644-5,13,17

14644-4,7 14644-3,4

+ cleanliness attributes

Demonstrate control Operation

14644-5,13,17

14644-14,15,16,18

Contaminans

Surface

Air

Particles

14644-9

14644-1,3

Viables

14698-1

14698-1

NA

14644-12

14644-10

14644-9

Nanoscal particles Chemicals

Table 1. Overview of standards to be used when setting up and operating a contamination solution For the determination of cleanliness levels, the measurement method that will be used is also important, since different measurement methods can give different cleanliness levels.

So cleanliness requirements should be set at critical locations. The required standards depend on the type of contaminants. Cleanliness levels for the contaminants of interest can be set for both air and surfaces.

Establishing control To be able to perform contamination control, a clean facility plus a set of appropriate operational procedures are required. People often tend to focus on the cleanroom, but to make the design fit for use the operational procedures will have impact on the design of the lay out and the air handling system.

By the use of separative devices, the cleanroom can be made more effective and more energy efficient.

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So for establishing control the standard on design, construction and start up should be combined with the standards that provide information on the determination of source strength. The standard on the operations can be used to design the operational procedures. Operational procedures will impact the particle deposition rate level.

After the design, the facility is constructed and equipment and procedures are implemented the effectiveness of the established control should be verified.

2 are used.So for the realisation of the contamination control solution of the assembly of this medical device, 10 standards (ISO 14644-1, 2, 3, 4, 5, 7, 14, 17 and 18 and ISO 14698 or EN 17141) of the 18 available standards are used.

Overview ISO-CEN cleanroom standards ISO 14644 Cleanrooms and associated controlled environments 1.

Demonstrating control When the contamination control solution is ready to operate, the cleanliness attributes of interest should be monitored to demonstrate control. When sufficient data are available the combination of the air handling and operation can be optimised. This is useful to prevent the use of more energy than necessary.

Use of cleanroom standards So keeping in mind the steps described above the right standards can be selected per step. This is given in the overview in table 1.

Take for example the assembly of a medical device that is packed after sterilisation. During assembly particles larger than 10 µm can give interconnection problems. After assembly the device is closed and there is no interaction with the outer surface.

The device has to be implanted into a patient and therefore it should be free of micro-organisms.

The incoming parts should fulfil specified cleanliness levels (part 9). During assembly particles can deposit from air, therefore a cleanroom with clean air is required (part 1 and part 17). After assembly the device is sterilised and packed. The surfaces of the device and packaging should be free of micro-organisms (14698-1). Deposition of microorganisms should be prevented by providing a clean environment (14698-1 and part 1 and 17).

For the design a cleanroom and two separative devices are foreseen (part 4 and 7). Two persons are going to work in the cleanroom. Estimated emission data for 0.5 µm and 5 µm particles and cfu’s (colony forming units) are taken from literature. The particle emission data are given by the supplier using part 14 and/or part 18. Operational procedures for entry and exit and cleaning are designed using part 5. Part 16 is used to design an energy efficient air handling system.

For the verification part 1, 3, 9 and 14698 are used.

For demonstrating control part 2, 9, 17 and 14698-

2.

3.

4.

5.

6.

7.

8.

9.

10.

11.

12.

13.

14.

15.

16.

17.

18.

Part 1 Classification of air cleanliness by particle concentration.

Part 2 Monitoring to provide evidence of

cleanroom performance related to air

cleanliness by particle concentration.

Part 3 Measurement method.

Part 4 Design, construction and start up.

Part 5 Operations.

Part 6 Definitions (withdrawn).

Part 7 Separate devices.

Part 8 Classification of air cleanliness with

respect to chemicals.

Part 9 Classification of surface cleanliness by

particle concentration.

Part 10 Classification of surface cleanliness by

chemical concentration.

Part 11 none.

Part 12 Specifications for monitoring air

cleanliness by nanoscale particle concentration.

Part 13 Cleaning of surfaces to achieve defined

levels of cleanliness in terms of particle

and chemical classifications.

Part 14 Assessment of suitability for use of

equipment by airborne particle concentrations.

Part 15 Assessment of suitability for use of

equipment and materials by airborne

chemical concentrations.

Part 16 Code of practice for improving energy

efficiency in cleanrooms and clean air devices.

Part 17 Particle deposition rate applications.

Part 18 Assessment of cleanroom

suitability of consumables.

ISO 14698 Cleanrooms and associated controlled environments; bio-contamination: a.

b.

c.

Part 1 Bio-contamination control: general principles and methods.

Part 2 Evaluation and interpretation of biocontamination data.

CEN revision EN 17141 Bio-contamination.

Standards in Italics are still in preparationt

Contamination Control Magazine volume 3-20188

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NANOTECHNOLOGY Prof. dr. ing. Dave Blank is a scientific ambassador and university professor at the University of Twente.

He is professor of nano materials and member of various advisory boards.

He has (co) authored more than 300 scientific publications and gives a multitude of lectures in the field of nanotechnology.

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Keynote speaker

Dave H.A. Blank is the opening keynote speaker at ISCC’18 on Monday 24 September. He started his studies at the primary technical school (LTS), followed by the secondary technical school (MTS) and higher technical school (HTS). In 1991, after his masters in Applied Physics, he received his PhD in Physics from the University of Twente, Netherlands for his dissertation on High-Tc thin films prepared by laser ablation: an experimental study, under supervision of prof. dr.

Horst Rogalla.

Dave Blank: Discover

In 1992 he became assistant professor in Rogalla’s group. After a research fellowship at Stanford in the group of prof. Malcolm Beasley and prof. Theodore Geballe in 1998, he was appointed as associate professor and programme director on the materials science of interfaces in the MESA+ Institute for Nanotechnology at the University of Twente.

Since October 2002 he is full professor in Inorganic Materials Science at the same university.

the mega

On January 1, 2007 he became the Scientific Director of MESA+ Institute for Nanotechnology, University of Twente. MESA+ hosts over 550 scientists with an annual budget of over 50 MEuro.

impact

Chief Scientic Ambassador From September 2016 he is Chief Scientific Ambassador and Distinguished Professor at the University of Twente. The Inorganic Materials Science research group focuses on growth studies, deposition and structuring techniques, and properties of complex materials, especially oxides. The group developed strategies to build inorganic materials, in an atomic layer-by-layer fashion, by true atomicdeposition control thereby exhibiting novel and unprecedented properties. His research is based in large part on inventing designer-inorganic (tailormade) nanomaterials that are prepared by atomic precision. He has (co)authored over 300 papers in refereed journals, holds an h-index of 48, and supervised 34 PhD candidates.

with miniscule

“

nano

technology

Together with prof. Guus Rijnders, the first timeresolved high pressure RHEED-system was developed, operating in-situ during pulsed laser deposition at high pressures up to 100 Pa. With this system several new growth phenomena have been observed, leading to new growth techniques of complex materials, like pulsed laser interval deposition. Furthermore, the systems can be used to study and realize block-by-block deposition of (artificial) complex materials. The latter has helped to create an entire new branch of science in inorganic materials which rests on the exact and precise control

of atomic arrangements through building structures in a bottom-up fashion and having direct one-to-one, atomic-scale control of the constituting layers.

Many of his latest discoveries and contributions have enabled the synthesis of materials, allowing for practical applications in the fabrication of artificial high-temperature superconductors and ferroelectric superlattices.

At this present time, many of the structures are being used in the fabrication of two-dimensional electron gasses in the field of interface engineering of complex oxide heterostructures.

Future oxide device developments Nowadays, the field of study is considered as a key research area for future oxide device developments.

These scientific achievements were honoured as one of the most remarkable scientific breakthroughs of 2007 (Science 318 (2007) 1844) of the interface engineering in complex oxide heterostructures, which showed the ability to make novel combinations of oxides that can outperform semiconductor structures.

Contributions in this field are reported in, e.g., Nature Mat. 5 (2006) 556, Nature Mat. 6 (2007) 493, Nature Mat. 7 (2008) 270, Adv. Mat. 21 (2009) 1665.

Besides all this, Blank is member of the Royal Society of Arts and Sciences, Gothenburg. He is member (Captain of Science) of TopTeam “High Tech Systems and Materials” appointed by the Minister of Economic Affairs of the Netherlands. He is member of AcTI, Dutch Academy of Technology and Innovation and he is a member Advisory Council for Science, Technology and Innovation Policy (AWTI) that advises the Dutch government and parliament on policy in the areas of scientific research, technological development and innovation. From 2010 he is chairman of NanoNextNl. He has given over 100 invited and plenary presentations, including presentations for broader audiences, like Lowlands and Zwarte Cross open-air pop festivals. t

Contamination Control Magazine volume 3-2018

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MICROBIOLOGY Bas Zaat is one of the Amsterdam Academic Medical Center's principal investigators.

Focus of his research: biomaterial-associated infections and novel antimicrobial stategies.

Biomaterial-associated infections, i.e. infections of biomedical devices, or “biomaterials� (catheters, prosthetic heart valves, implants), are a major and increasing problem in modern medicine, especially in view of the increase in antibiotic resistance.

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Keynote speaker

Dr. Sebastian A.J. Zaat is the second keynote speaker at ISCC’18. His area of expertise is Health Care. He is Principal Investigator of the research line “Biomaterial-associated infection and novel antimicrobial strategies” of the Amsterdam Academic medical Center, The Netherlands. His research is focused on pathogenesis, prevention and treatment of biomaterial-associated infections, both in soft tissue (catheters, surgical meshes) and bone (implants, fixation devices).

Bas Zaat:

How to cure bacterial

infections that can't be controlled

“

with

antibiotics?

Based on a thorough understanding of the events leading to infection, novel strategies are being developed including rapid microbial diagnosis, antiinfective coatings not subject to bacterial resistance development, prevention of biofilm formation, and enhancement of killing of bacteria hiding in tissue surrounding inserted or implanted medical devices.

These approaches are aimed at maximally reducing the risk of infection for patients who depend on such medical devices.

antimicrobial components of one medicinal honey and are investigating the components responsible for the antimicrobial activity of a large collection of monofloral honeys in order to identify novel antimicrobials, in order to provide additional solutions for the major problem of antibiotic resistance. t

Biomaterial-associated infections Infections of biomedical devices, or “biomaterials” (catheters, prosthetic heart valves, implants), are a major and increasing problem in modern medicine, especially in view of the increase in antibiotic resistance. The research has discovered that bacteria do not only colonize the medical device by biofilmformation, but also persist in surrounding tissue, due to disturbed local immunity. Bacterial, biomaterial, and host-responses involved in the pathogenesis are subject of studies, in order to find novel approaches for treatment and prevention. In the NANTICO (Non-adherent ANTImicrobial Coatings) consortium project different antimicrobial coating strategies have been developed to prevent infection. In the IBIZA (Imaging of Biomaterial-associated Infection using Zebrafish Analysis) a novel model for testing new biomaterials is being developed, and in the BALI (Biofilm Alliance) EU FP7 project we develop novel Synthetic Antimicrobial Antibiofilm Peptides for controlled release coatings to prevent infection of titanium implants.

Novel antimicrobial strategies The increase in antibiotic resistance necessitates investigations into novel antimicrobial strategies.

For this we study cationic antimicrobial proteins and peptides (AMP) and natural sources such as medical grade honey. We have identified thrombocidins as the major AMP of human blood platelets, and have designed novel SAAPs (see above) based on their structure. The mechanism of action of these SAAPs is studied in depth, and they are utilized for a variety of translational research projects. Honey has been used as an antimicrobial agent since ancient times. We have fully characterized the

Contamination Control Magazine volume 3-2018

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EUVLITHOGRAPHY Using high energy lasers, EUVL etches details on nanoscale onto silicon wafers for the production of microchips.

The next generation of microchips should enable innovations in health, electronics, entertainment, self-driving cars, robotics and artificial intelligence.

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Keynote speaker

Vadim Banine is Director Defectivity Department at ASML. At ASML Vadim Banine has been working on the EUVL (Extreme Ultraviolet Lithography) since 1966.

The physicist did a two year research at the Eindhoven University of Technology, where he also got his PhD. Vadim Banine is a part time professor at the Eindhoven University of Technology. Banine's research interests include EUV lithography, plasma physics, surface physics and chemistry as well as accelerator technology.

EUV lithography is a promising technology for making electronic chips smaller and more powerful - a promise that ASML, in collaboration with universities such as TU/e, Twente University and the Russian ISAN, means to turn into a reality.

Vadim Banine:

Smaller

and more powerful microchips are the key

“

to new

applications

At ASML, Banine is responsible for general research program definition and roadmapping, managing and coaching research project leaders, external laboratories and projects worldwide and the development of the EUV research process, its knowledge base, working group capacity and external network. His strong career in industry makes Banine an expert on the organization and development of research programs and groups, project leadership, combining enterprise and science and bringing results to development. Banine is a member of the Scientific Advisory Committee (SAC) at FOM. He has more than 60 patents, is the winner of the ASML patent award and has over 40 publications to his name.

For ASML, cleanliness means that the amount of particles (defects) or molecular contamination on a contamination critical surface does not impact system performance beyond its specification for the complete lifetime of the system, both for the lithographic system itself as well as the substrates of ASML’s customers.

•

reticle backside impact the substrate flatness and thus the printing quality of structures that need to be printed onto the wafer impacting device performance, or worse case resulting in a nonfunctional device.

Availability: removal of contamination (cleaning) is typically a time consuming activity that results in system down time.

Throughput through Optics lifetime: at certain contamination levels transmission of the system reduces, which decreases amount wafers, which can be produced in the unit of time.

New Technology In the current presentation the path of EUV lithography from an historic perspective as well as the view on it in the future will be shown. Particular changes in recently new technology with respect to cleanliness specifications, analyses, design, tooling, skills etc. will be described. t

New Vision In recent years, with the introduction of Extreme Ultraviolet Lithographic (EUVL) systems, cleanliness requirements have become even more tight and it can be said that they acquired a new meaning.

A significant paradigm shift occurred, while the engineers building lithographic systems operating under normal pressure, with refractive optics and deep UV laser radiation had to adapt operation in vacuum, with multi-layer reflective optics and under EUV radiation. It introduced a new vision with respect to cleanliness and defectivity.

Both molecular and particle contamination are being considered for EUVL. The system performance parameters impacted by contaminants are: • Yield loss: particles on wafer front side and particles on reticle (mask) damage the structure that needs to be printed on the wafer resulting in a non-functional device.

• Overlay and focus: particles on wafer and

Contamination Control Magazine volume 3-2018

15

FUTUROLOGIST Peter Ros is entrepreneur, strategist, 'boardroom sparring partner' and international keynote speaker. He has strong ideas about technological developments and trends and their impact on people, companies and society as a whole.

16

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Keynote speaker

Digitization and the exponential growth of technology stresses the urge for a flexible and agile mindset, because disruptive changes arrive at ever increasing speed! What meta-trends will be relevant and what kind of 'modus operandi’ do we need to develop ourselves as a human being, organization and society?

Future strategist Peter Ros explores several of these technological trends and will give some suggestions for a useful attitude towards the upcoming changes that will confront us.

Peter Ros:

I try to make the room think and to go home with energy and perspective for the future

Peter Ros has very specific ideas about technological developments and their impact on society. He mainly focuses on how society is able to benefit and make optimal use of all the current emerging and disruptive technologies.

From nano- and neurotechnology to photonics, robotics and artificial intelligence. As co-founder of the Permanent Beta Platform he was one of the first to outline the significance of increasing (inter) connectivity and the importance of swarm people who are willing to share information and knowledge.

Moreover, Peter Ros knows human behaviour and emphasises the societal impact and the way in which employers, employees and organizations can best respond to them. His fascination for the combination of technology and human insight makes his story a powerful message.

Peter Ros sees kick-starting the Permanent Beta initiative as his most important project of the past five years. This platform is a hub for representatives of the digital forefront, social innovators, scientists and artists. Here, experts share knowledge, explore new horizons and create spaces in which they experiment with how society can make optimal use of technology and connectivity. t

Contamination Control Magazine volume 3-2018

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“

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Unlike reusable fabric garments, DuPont™ Tyvek® IsoClean® garments are single-use, which helps prevent unforeseen contamination risk.

See how Tyvek® IsoClean® outperforms reusable garments. tyvek.com/invisible

Copyright © 2018 DuPont. All rights reserved. The DuPont Oval Logo, DuPont™, For Greater Good™, IsoClean® and Tyvek® are trademarks or registered trademarks of E.I. du Pont de Nemours and Company or its affiliates.

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Differential Pressure Sensor

Turfschipper 114 | 2292 JB Wateringen | Tel. 0174 272330 | info@catec.nl | www.catec.nl

EE 600 pressure sensor for HVAC applications.

The EE600 is dedicated for the measurement of differential air pressure in ventilation and air conditioning systems or filter monitoring.

Range EE600 : 0-250/500/750/1000 Pa EE600HR : 0-2500/5000/7500/10000 Pa Accuracy 0...1000Pa ± 2% FS / 0...10000Pa ± 1% FS Response time 50 ms / 500 ms / 2 s / 4s Outputs 0-5/10V en 0/4-20mA Power supply 15-35 V DC of 24 V AC ±20 % Features: •Multi-Range measurement •Fully configurable •Large graphic display •Installation friendly enclosure

Applications: •HVAC applications •Filter control measurement •Air treatment •Flow measurement •Operation and patient room monitoring.

Optional display with backlight!

NEW!

Visit CaTeC at the ISCC exhibition!

info@catec.nl - www.catec.nl

TIME

MONDAY 24 SEPT

08:00 - 08:30

REGISTRATION

08:30 - 09:15

OFFICIAL OPENING ISCC’18

09:15 - 10:00

KEYNOTE SPEAKER

10:30 - 11:45 11:45 - 13:00 13:00 - 14:00 14:00 - 15:15

SOCIAL CULTURAL PROGRAMME FOR SYMPOSIUM PARTICIPANTS AND ISCC REPRESENTATIVES

10:00 - 10:30

BREAK AT THE EXHIBITION S1

S2

S3

S4

S5

S6

S7

S8

S9

S10 S11 S12 BREAK AT THE EXHIBITION

15:45 - 17:00

S13 S14 S15 S16

19:00

REGISTRATION

18:00 - 19:00

WELCOME PARTY 17:00 - 20:00

17:45 - 18:15

T1 W1

LUNCH AT THE EXHIBITION

15:15 - 15:45

17:00 - 17:45

14 20

SUNDAY 23 SEPT

W2 T2 W3

KEYNOTE SPEAKER DRINKS AT THE EXHIBITION

BANQUET AT THE LOUWMAN MUSEUM BANQUET DINNER

PROGRAMME TIME

TUESDAY 25 SEPT

08:00 - 08:30

REGISTRATION

08:30 - 09:15

KEYNOTE SPEAKER

09:15 - 10:30

S17 S18 S19 S20

10:30 - 11:00

BREAK AT THE EXHIBITION

WEDNESDAY 26 SEPT

W4

T3

TECHNICAL VISIT

11:00 - 12:15 S21 S22 S23 S24 W5 W6 12:15 - 13:15 13:15 - 14:30

LUNCH AT THE EXHIBITION S25 S26 S27

W7

14:30 - 15:00

BREAK AT THE EXHIBITION

15:00 - 15:45

KEYNOTE SPEAKER

15:45 - 16:45

LUNCH

W8 T4

TECHNICAL VISIT

CLOSING CEREMONY ISCC’18

CLOSING CLOSING DINNER ATDINER MUSEUM

S= SPEAKER SESSION W=WORKSHOP T=TUTORIAL

BEELDEN AAN ZEE Contamination Control Magazine volume 3-2018

21

TIME

PROGRAMME MONDAY 24 SEPTEMBER REGISTRATION

08:30

OFFICIAL OPENING ISCC’18

09:15

KEYNOTE SPEAKER

10:00

BREAK AT THE EXHIBITION

Cleanroom airborne contamination in relation to outdoor airborne contamination Michel Thibaudon

•

Development of the guideline for the classification and testing of air permeability of the cleanroom envelope and similar controlled environments Harm van den Oever - Kuijpers

•

Ultra fine dust and health with controllable deposition of Nano structured particles in clean rooms and other technologies Bob Ursem - TUD How technical trends enhance selection and performance monitoring of garments

10:30

New selection criteria of protective garments for cleanrooms and controlled environments Steve Marnach - DuPont

•

To reuse or not to reuse: a global study on the performance of cleanroom garments over their life cycle Matheus Rodrigues Barbosa - DuPont

•

The digitalization of cleanrooms Dennis Smeijer and Arthur Lettinga - Berendsen Requirements for space and photonics +...

10:30 •

Biocontamination control in space industries: a general overview Markus Keller and Udo Gommel - Fraunhofer IPA

•

Contamination study of space sensitive surfaces by packaging materials Delphine Faye - CNES

•

From clean machine to…

Philip van Beek - Contamination Q&A

•

Food industry Contamination control and hygienic design in the food industry Frans Saurwalt - Kropman

•

Proposed changes to EU GMP Annex 1 & Draft Revision ISO-DIS 14644-3:2016 Sheesh Gulati - Measuretest

•

Invited speaker

•

Contamination in laser optics Research on precision cleaning technologies for large aperture optics Xiao Dong Yuan - CAEP

•

The study of laser induced damage owing to surface contamination for lager aperture optics in high power laser facility Xin Xiang Miao - CAEP

•

Study of organic contamination removed by plasma cleaning technology for critical surface Hao Liu - CAEP Design and construction

11:45

13:00

•

Cleanroom zoning, the challenge of pressure differential and flow Frans Saurwalt - Kropman

•

Clean and protective environment – CAPE Udo Gommel - Fraunhofer IPA

•

Ventilation equations Keith Beattie, EECO2 life science Lead

LUNCH BREAK AT THE EXHIBITION

14:00

Operating theatre contamination •

A comparison between measured values of airborne viable particles and calculated values with the dilution principle in operating rooms with low velocities unidirectional air flow systems Bengt Ljungqvist - Chalmers University

•

Distribution of microbial contaminants in operating theatres and healthcare environments Eugen Lichtmer - Technical University Berlin

•

Contamination control in operating theatres Remko Noor Practical approaches towards developing life science facilities

14:00 •

Case study on hospital aseptic compounding facilities and radiopharmacies Conor Murray - 3-dimension

•

Guidelines central sterilization department Paul Joosten - Kuijpers

•

Digitizing the interpretation process in environmental monitoring Jean-Paul Sanders - Microtechnix

OR design from a different perspective •

Hospital project in Brasil Antonio Gamino - GPAX Consult

•

Contamination control in displacement ventilated operating theaters Fransesco Romano - Polimi

•

Ozon cleaning in OR’s Johannes K-M Knobloch

Monitoring air and surface cleanliness (technical applications)

14:00 Time schedule Tutorial 1 continues 

22

11:45

Risk analyses in life science Why establishing contriol proves to be difficult André van Tongeren IMI Aero Dynamiek

Program of Requirements Cleanroom concepts Design and Construction Operational procedures

11:45

•

• TUTORIAL 2: • Establish Control • from 14:00 - 17:00 • Frans Saurwalt and Arnold Brunner

•

Risk assessment (Product, Process, FMEA, HACCP) Cleanliness (air, surface and transfer) and standards Contamination control solutions Requirements

•

• TUTORIAL 1: • from 10:00 - 13:00 • Cleanroom requirements Koos Agricola and Conor Murray •

Outdoor airborne contamination in hospitals and cleanrooms

10:30

11:45

Dave Blank, University Twente

10:30

PROGRAMME MONDAY 24 SEPTEMBER

t TUTORIAL 1

08:00

TIME

•

Environmental monitoring Jason Kelly - Lighthouse

•

Traceable calibrations Edwin den Hartog - Kalibra

•

Fast particle cleanliness monitoring of high tech product surfaces Anton de Jong - TNO

Time schedule Tutorial 2 continues 

MONDAY 24 SEPT TIME 14:00

ICCCS STANDARDS •

ISO TC209 new cleanroom standards and outreach projects I Berthold Duthorn - Bosch

•

ISO TC209 new cleanroom standards and outreach projects II Da Qain Wang - CCCS

•

ISO TC209 new cleanroom standards and outreach projects III David Ensor

BREAK AT THE EXHIBITION Introduction of VCCN guideline 8: in use monitoring of operating theatres

15:45 •

Introduction of VCCN guideline 8: In use monitoring of operating theatres Roberto Traversari - TNO

•

Introduction of VCCN guideline 8: In use monitoring of operating theatres II Martin Janssen- Radboudumc Safety and standardisation challenges for life science facilities

15:45 •

Preparing parenteral nutrition formulations: hospital pharmacy compounding department Mathieu Wasiak - CHU Clairmont-Ferrand

•

Development and status of the CEN Biocontamination control project (European standard) Michel Thibaudon

•

Requirements for detergents used in non sterile pharmaceutical applications Thomas Altmann - Ecolab Contamination risk in semi conductor industry

15:45 •

New method for the assessment of condensed contamination by chemicals onto surfaces (SCC) Vanessa Pfenning - Fraunhofer IPA

•

Think outside the box: film type contamination, their impact and ways of detecting and avoiding Marcel Kleßen - TREAMS

•

Residual gas analysis as tool for material screening for UHV applications and comparison to other emission test methods Markus Keller, Udo Gommel - Fraunhofer IPA

14:00

17:00

Monday 24 September 11:45 – 12:45 Cleaning 14:00 – 15:00 Impact of nano electronics 15:45 – 16:45 Commissioning & verification

t TUTORIAL 2

15:15

WORKSHOPS MONDAY 24 SEPTEMBER

PROGRAMME MONDAY 24 SEPTEMBER

LOUWMAN MUSEUM On Monday 24 September ISCC’18 organizes a banquet dinner at the Louwman Museum. As well as wonderful food, you will enjoy an amazing location. You can add the banquet dinner to your personal programme via your registration.

The Louwman Museum is home to the world’s oldest private collection of motorcars, compiled by two generations of the Louwman family. The museum dates back to 1934 and now comprises over two hundred and fifty antique and classic motorcars. Experts regard the collection as one of the most beautiful in the world. The museum exudes passion. Each car has its own story to tell, its own contribution to history. The motor car is a mirror of culture.

The collection is housed in a purpose-built museum in The Hague, the city where P.W. Louwman established his Dodge and Chrysler import company. The building, designed by American architect Michael Graves, blends in sympathetically with its historic surroundings. The landscape gardens, designed by Lodewijk Baljon, complement the architecture of the building.

Energy management

•

Analysis of operation and energy consumption of hospital’s isolation room Wim Zeiler - TUE

•

Ventilation eff improvement Paul Molenaar - TUE

•

Modern PTFE membrane based HEPA/ULPA filters for improved energy savings and risk reduction Marc Schmidt - AAF

KEYNOTE SPEAKER

Bas Zaat, Amsterdam Medical Center

17:45

DRINKS AT THE EXHIBITION

19:00

BANQUET AT LOUWMAN MUSEUM Contamination Control Magazine volume 3-2018

23

TUESDAY 25 & WE TIME

PROGRAMME TUESDAY 25 SEPTEMBER

08:00

REGISTRATION

08:30

•

Design and testing of an noninvasive airborne moleculair contamination monitoring system for a front-opening unified-pod for sub 10nm semiconductor manufacturing process Bryan Puruncajas - National Taipei University of Technology

•

Cleanliness quantification of wafer metrology systems John Timmermans - NTS

Standard developments for operating theatres and isolation rooms in Europe Frans Saurwalt - Kropman

•

The future proof OR isolation rooms in Europe Remko Noor Biosafety risks and preventions Analysis of cross-infection in a hospital’s isolation room Ilse Schoenmakers - Arcadis

•

High containment BSL 3-4 Paul Joosten - Kuijpers

•

Biosafety cabinet with air isolation system (AIS) for tissue engineering Naoki Ogawa - Airtech Contamination risks and control solutions for electromechanical devices

•

Creating, implementing and maintaining a monitoring plan based on risk assesment HaŞim Solmaz - Ligthouse

•

Risks due to the use of cleanroom technology components Joachim Ludwig - Colandis

General standards

11:00

12:15

Development and use of thermally generated aerosol for cleanroom airflow visualisation testing and HEPA filter challenging Trevor Dunnington - Concept Smoke ISO 14644-3 B7 installed filter leakage tests a comparison and guidance Tim Triggs - ATI

•

Magnetic Field Interference – A Rising Consideration for Semiconductor Fab and Process Tool Design Wolfgang Eißler - M+W

BREAK AT THE EXHIBITION

11:00

Design and construction •

Offsite construction – the latest innovation in global clean­ room manufacturing Rowin Vos - Connect 2 Cleanrooms

•

Clean build protocol Andrew Watson - CBE Pty

•

POD’s offsite vs site constructed flexible modular cleanroom approaches Conor Murray - 3-dimension

• • •

Cleaning and desinfection

Cleaning and disinfection programs part of a lifecycle approach: future Annex 1 requirements Walid El Azab - Steris Development of a harmonised method for cleanroom hard surface disinfectant efficacy evaluations Rachel Blount - Ecolab

Time schedule Management of non-viable particle excursions in the context of Tutorial 3 the new ISO14644-2 Olivier Chancel - Boehringer Ingeheim continues 

•

Comparison of the photometer and airborne particle counter methods for integrity testing of HEPA and ULPA filters according to ISO 14644-3 Bernard Thaveau - Aerolab

•

Cleanliness behaviour of consumables; PWI Udo Gommel - Fraunhofer IPA

LUNCH BREAK AT THE EXHIBITION Operations in space industry

13:15

•

Evaluation of decontamination process adapted to large optical components David Cheung - Entegris

•

Statistical illustration of cleaning method efficiencies for flight hardware surfaces Thomas Jordan - Airbus

•

Particulate contamination size distribution on optical systems evaluation Sabine Dagras - Airbus Defence and Space Effective control pharmaceutical manufacturing

13:15 •

Case studies of recurrent microbial contamination benefit of EM data review and periodic audit of practices Walid El Azab - Steris

•

Microbiology single use impactor head Frank Panofen - Particle Measuring Systems

•

Cleanliness assessment and cleaning validation of medical devices Udo Gommel - Fraunhofer IPA

13:15

Particle deposition and surface cleanliness •

CLEAPART-100 to monitor particle deposition rate in laser cleanrooms Isabelle Tovena Pecault - CEA

•

The PFO 1000 Monitor: A novel real-time, in-situ, automated instrument for monitoring particulate fall-out in clean environments Andrew Holland - XCAM

•

Particle deposition rate applications Koos Agricola - Technology of Sense

14:30

BREAK AT THE EXHIBITION

15:00

Peter Ros, Futurologist

15:45

CLOSING CEREMONY

KEYNOTE SPEAKER

Measurement methods Verification Monitoring Applications

•

ISO/DIS 14644-15: Assessment of suitability for use of equipment and material by airborne contamination by chemicals (ACC) Markus Keller - Fraunhofer IPA

Contamination monitoring •

•

• TUTORIAL 4: • from 12:45 - 15:45 • Demonstrate control André van Tongeren and Robert Mielke •

Contamination control applied to inkjet printhead Koos Agricola - Océ Technologies

Cleanroom behaviour Cleaning Maintenance Procedures

•

• TUTORIAL 3: • from 09:15 - 12:15 • Cleanroom operations Philip van Beek and Chris Delaney •

•

t TUTORIAL 3

Establishing contamination control for future proof hospitals

Vacuum spikes: effects and control of contamination on vacuum sealing surfaces Konstantinos Gkrekos - Thermo Fischer Scientific

10:30

24

Contamination control in semiconductor industry •

Industry innovation agenda on contamination control in hospitals Roberto Traversari - TNO

•

11:00

11:00

KEYNOTE SPEAKER

•

09:15

09:15

PROGRAMME TUESDAY 25 SEPTEMBER

Vadim Banine, ASML

09:15

09:15

TIME

EDNESDAY 26 SEPT WORKSHOPS TUESDAY

TIME

07:30-09:45

Bustour to ASML

09:45-12:00

ASML Experience Center

12:00-12:30

Bustour to Philips Innovation Center

12:30-13:30

Lunchbreak

13:30-15:00

Philips Innovation Center

15:00-16:45

Bustour to The Hague

Beelden aan Zee On Wednesday 26 September ISCC'18 organizes a closing dinner at Museum Beelden aan Zee. The museum, hidden in the dunes, right behind the boulevard of Scheveningen is a unique venue.

This privately founded museum is housed in one of the finest museum buildings in the Netherlands, designed by the famous Dutch architect Wim Quist. The museum was built using sand coloured materials, to blend with its seaside location.

07:30-09:45

Bustour to Philips Medical Care

09:45-12:30

Philips Medical Care

12:30-13:00

Bustour to Philips Museum

13:00-14:00

Philips Museum

14:00-15:00

Lunchbreak

15:00-16:45

Bustour to The Hague

You will discover a special collection of sculptures in the beautiful building. The museum is the only museum in the Netherlands that specializes in modern and contemporary international sculpture.

The collection holds work by sculptors as diverse as Armando, Stephan Balkenhol, Iris Le Rütte, Tony Cragg, Per Kirkeby, Giacomo Manzú, Kiki Smith, Igor Mitoraj, Jan Meefout, Berlinde De Bruyckere, Shinkichi Tajiri and Cornelis Zitman.

08:30-09:45

Bustour to ESA/ESTEC

10:30-12:00

ESA/ESTEC

12:00-12:45

Bustour to Space Expo

12:45-13:45

Lunchbreak

13:45-16:00

Space Expo

16:00-16:45

Bustour to The Hague

08:30-09:30

Bustour to HAL ALLERGY

10:00-11:00

HAL ALLERGY

11:00-11:15

Walk to Biotech Training Facility

11:30-12:30

Biotech Training Facility

12:30-13:15

Lunchbreak

13:15-13:30

Bustour to Rijksmuseum Boerhave

13:30-16:00

Rijksmuseum Boerhave

16:00-16:45

Bustour to The Hague

17:30-21:30

CLOSING DINNER at Beelden aan Zee

Tuesday 25 September 09:15 – 10:15 Implementation GMP annex 1 11:00 – 12:00 Particle deposition monitoring 11:00 – 12:00 New guideline for CSD 13:15 – 14:15 Development international

guideline for hospital ventilation 13:15 – 14:15 Hygienic design

1 2 3 4

PROGRAMME WEDNESDAY 26 SEPTEMBER

Contamination Control Magazine volume 3-2018

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Contamination Monitors

STERILITY ASSURANCE

Services

Environmental Monitoring Systems

Voor meer informatie contacteer: pmeasuring.com T: +32 10 23 71 56 E: pmsbenelux@pmeasuring.com

Training and Education

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EXHIBITORS ENTRANCE

x1

x2

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x7 x4

part of Elis

A AAF 40 AerSMASH x7 Alcochem 46 ATI 28 Audion Packaging Machines 12 Avidicare 11 B BaseClear 44 Berendsen part of Elis A&B C Camfill x6 Catec 21 Charles River 17 Cleanroom Combination Group 42 & 43 Cleanzone x1 Climatech 29 Connect 2 Cleanroom 1 Contec Inc. Ltd. 34 Copan 48 Cotes 13 CSI 10 D Denios 16 Dupont 27 Dutch Cleanroom Furniture 35

E Ecolab België 25 EHEDG 47 G Guardtech Engeland I IMI Aero-Dynamiek 33 Industrial HVAC Control Soluations 14 Infuser / Novidis Initial Eindhoven ISCC’20 Turkey x4 K Kalibra 18 Kingspan 2 Kropman Installatietechniek 38 Kuijpers 39 L Laser Vision 54 Lighthouse 22 M MANN + HUMMEL 19 MBV AG 6 N Nestinox NORA flooring 36 O

Optimus AG 60 P Pedak 45 Philips 41 PMS 30 PP4CE F Pro Cleanroom Valkensvaard 26 R RevDesinfectieRobots 5 Romex x5 Royal HaskoningDHV 31 S SAC Nederland 15 Staxs 24 Steris Belgium 37 T Tatasteel NL Technology of Sense 32 Texwipe 56 V VCCN 7 W Weiss Technik 23 Williamson - Dickie 20 X Xcam Northhampton 8 Contamination Control Magazine volume 3-2018

27

PRINTED FLEXIBLE SILICONE ELECTRONICS ON PAPER The new production process for printed flexible electronics makes it possible to print high performance chemically stable crystalline silicon on flexible, biocompatible or biodegradable substrates such as paper.

The new process uses a novel ‘silicon ink’ that uses UV light to cure, instead of the traditional very high temperatures. Because crystalline silicon can be used, there is no need for poor performing and often toxic organic inks.

WHEN? The process has been developed, optimised and patented. Basic circuit components have been fabricated, confirming superior performance and improved chemical stability. The next step is to develop a complete sensor system.

Ryoichi Ishihara – Technical University Delft

NANOPARTICLES AT THE PUSH OF A BUTTON Nanoscientsists spend the majority of their time on the synthesis of nanoparticles. Besides, it is very hard to scale up production. VSParticle eliminated both challenges by simplifying the production of nanoparticles.

The VSParticle Generator One uses spark ablation to produce well defined nanoparticles of 0-20 nm in diameter. By adjusting gas flow, spark energy and spark frequency, the particle size and production rate can be controlled.

VSParticle offers a cost effective, on-demand, on-location way of producing nanoparticles. It brings nanotechnology from the lab to commercially available products in microelectronics, catalysis and healthcare.

Aaike van Vugt – VSParticle

IN AIR MICROFLUIDICS, NO CHIP REQUIRED IamFluidics has invented in-air microfluidics (IAMF), which enables the production of monodisperse microdroplets and -particles at industry-level production rates while maintaining the resolution of microfluidics. IAMF is a novel chip-free technology that enables the production of monodisperse micro-emulsions and micro-suspensions at industry-level production rates while maintaining the resolution of conventional microfluidics.

PHOTONIC INTEGRATED CIRCUITS Photonics is the key enabling technology engine needed to keep the globe communicating and connected. It provides the bandwidth, speed, reach and flexibility needed to run new applications that everyone knows – healthcare & life sciences, internet of things, M2M, social media, big data, data centers, cloud computing and voice over IP. It’s an energy efficient technology with which to scale up all these services.

LioniX International offers several solutions and services for assembly and packaging of Photonic Integrated Circuits (PIC). These specifically apply to prototypes, demonstration models and small-volume series of end products.

Arne Leinse – LioniX International

28

Menno Noorlander – IamFluidics

DEMONSTRATORS

LAB-ON-A-CHIP A FULL-SCALE LABORATORY ON A MICROSCALE Lab-on-a-chip technology makes it possible to conduct miniaturised lab analysis on micro- or nanoscale. The chips can vary in size from a few millimeters up to a few square centimeters.

Lab-on-a-chips contain channel structures and have one or more laboratory functions built within. The number of applications is still growing and lab-on-a-chip technology is now related to the fields of microfluidics, MEMS* and µTAS**.

Application areas of lab-on-a-chip devices The time when lab-on-a-chip technology was only for analysis purposes, has long been over. It is no longer only a scientist’s territory. Nowadays lab-on-a-chip technology is becoming part of the common world. Especially the medical world, where point-ofcare testing gives us quick results and reduces the workload for doctors and analysts.

HIGH RELIABILITY SUNSENSORS FOR SPACE AND TERRESTRIAL APPLICATIONS Lens R&D supplies high reliability Sunsensors for space applications small enough to be used on small satellites but good enough to be used on big ones as well.

The BiSon64 and BiSon64-B Sunsensors are qualified to extreme levels of environmental loading and qualified over a temperature range of -40°C to +80°C with planned flights on several satellites (ESAIL, VESTA, Earth-I etc).

The BiSon 64-ET and BiSon64-ET-B Sunsensors are under full ESA SCC qualification (within a GSTP program) over a temperature range of -125° to +125°C. Where a flight contract has been signed for the delivery to the ESA Proba-3 mission, these sensors will be qualified for 15 years in GEO orbit.

Erik Staijen – Micronit Microtechnologies In preparation for the future Lens R&D is also working on albedo insensitive analogue Sunsensors based on SiC detector technology in frame of a Dutch high tech systems and materials program (HTSM) as well as a small digital Sunsensor for telecom applications in frame of an ESA Artes program.

Johan Leijtens – Lens Research & Development

Contamination Control Magazine volume 3-2018

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WORKSHOPS GOLD IN THE CLASSROOM: PRODUCE IT IN YOUR OWN MICROFLUIDIC LAB ON A CHIP As well as the regular workshop programme, ISCC’18 also organizes a chip technology workshop. The hands-on workshop will teach you some of the principles of labs on a chip by making and testing such devices yourself, and learning how this is done in the classroom.

Assembling and testing the devices requires a relatively small amount of time, and is practiced during the session. Simple chips can be produced using foil, a perforator and scissors. More complex chips can be made using an electronic cutting machine. Laser cutting is used for prefabrication of foil for rapid assembly of various chips. The selfmade chip is used to produce nanogold particles: Gold in the classroom.

Apart from the regular registration, there is no need to register upfront for visiting this workshop.

WORKSHOP PROGRAMME The workshop programme will take place in parallel with the conference programme. The workshops will give the participant the opportunity to have an interactive session about a specific topic. All workshops will be given in English will be about actual topics in Contamination Control. Each workshop will be given by experts on the specific topic. A workshop will take about one hour. When registering for the symposium you can select a workshop session instead of visiting the conference session. The maximum number of workshop participants is 25.

MONDAY 24 SEPTEMBER 11:45 – 12:45 Cleaning*

by Cees van Duijn and Chris Delaney 14:00 – 15:00 Impact of nanoelectronics

by Eric Stuiver and Philip van Beek 15:45 – 16:45 Commissioning & verification*

by Andre van Tongeren

TUESDAY 25 SEPTEMBER

LAB ON A CHIP MONDAY 24 SEPT

10:30 – 12:30 h 14:00 – 15:45 h TUESDAY 25 SEPT

09:15 – 1 1:00 h 1 3 :15 – 15:00 h

30

09:15 – 10:15 Implementation GMP annex 1

by Gert Beuving and Vanessa Pieters 11:00 – 12:00 Particle deposition monitoring

by Paul Joosten and Rene Vis 11:00 – 12:00 New guideline for CSD*

by Koos Agricola 13:15 – 14:15 Development international guideline

for hospital ventilation

by Frans Saurwalt and Roberto Travesari 13:15 – 14:15 Hygienic design*

by Frans Saurwalt * Each workshop participant should submit a question.

During the workshop participants will discuss the various questions.

TUTORIALS TUTORIAL PROGRAMME MONDAY 24 SEPTEMBER 10:00-13:00

14:00-17:00

Cleanroom Requirements • Risk assessment (Product, Process, FMEA, HACCP) • Cleanliness (air, surface and transfer) and standards • Contamination control solutions • Requirements (application) Establish Control • Program of requirements • Cleanroom concepts • Design and construction • Operational procedures

TUESDAY 25 SEPTEMBER 09:15-12:15

Cleanroom Operations • Cleanroom behaviour • Cleaning • Maintenance • Procedures

12:45-15:45

Demonstrate Control • Measurement methods • Verification • Monitoring • Applications

Tutorial Programme The tutorial programme will take place parallel with the conference programme. When registering for the symposium you can select a tutorial session instead of visiting the conference session. A tutorial will take about 2,5 hours (two speakers plus short break).

The tutorial will be led by an experienced workshop leader. The maximum number of participants for a tutorial is 25.

The ISCC 2018 tutorial programme gives a complete overview of the present (international) approach to cleanroom technology. Eight internationally known tutors will educate the participants on four main topics: 1. The use of risk assessment to determine the cleanroom technology that is required to control contamination sensitive products, processes and treatments by setting cleanliness requirements.

2. Design and construction of a cleanroom solution to establish the required contamination control.

3. Procedures to operate the contamination control solution in a cleanroom. Important operations are garment selection, changing procedure, cleanroom entry and exit and cleaning program. Measurement methods for verification (validation) and monitoring to demonstrate control.

4. The content is based on the present ISO TC209 standards (ISO 14644 and ISO 14698) and the future vision on these standards.

For each block, handouts of presentations are available. For each participant of a tutorial block, there is a tutorial book by Koos Agricola available.

If required a certificate of attendance can be issued.

The tutors are: • Koos Agricola (VCCN, ICCCS, CTCB-I, TC209

WG 1,3,4,11,12,13,14, CEN

TC243 WG 5) • Arnold Brunner (Switzerland, SwissCCS, ICCCS,

ISO TC209 WG 4,13) • Philip van Beek (VCCN, CTCB-I) • Chris Delaney (Ireland, ICS, CTCB-I, ICCCS, ISO

TC209 WG 12) • Robert Mielke (USA, IEST, Secretary ISO TC209) • Conor Murray (Ireland, ICS, ISO TC209

WG1,3,4,13,14, CEN TC243 WG 5) • Frans Saurwalt (VCCN, ICCCS, EHEDG, ISO

TC209 WG 3,4, CEN TC156 • André van Tongeren (VCCN, CTCB-I, ICCCS, ISO

TC209 WG 3,4)

Contamination Control Magazine volume 3-2018

29 31

TECHNASIUM TECHNASIUM, A NETWORK OF HIGH SCHOOLS IN THE NETHERLANDS Technasium is a national network of high schools in the Netherlands dedicated to encouraging students to choose science and technology oriented further education. Therefore technasium wants to increase the awareness of scientific and technological professions among high school students.

The core of ‘Technasium’ is to have students involved in real-life problems of a company or organisation. Therefore throughout their secondary school career Research & Design students, supported by field experts and coached by teachers, work on authentic tasks originating from companies.

The final assignment “meesterproef’ also involves Polytechnic or University experts.

A group of Research & Design students will be linked to your company’s case to look at it from a fresh angle and find innovating solutions to the problem.

After ten years of existence the secondary school course named Research & Design, is broadly accepted and recognised in the Dutch business world.

Companies of all sizes are connected to secondary schools and support learning engineering through research and design. These companies are not necessarily involved in engineering but do need engineering support.

Most of the companies appreciate unforeseen innovations suggested by students, “a fresh angle”, and gladly invest their time in possible future employees.

At last the ISCC 2018 symposium is on. The organising committee has worked on this event for two years. And although it seemed to take forever before we would actually meet in the Hague, now the time has come. It was a lot of work for the organising committee but we managed to put together a beautiful programme.

Take a look at the various sessions you can attend, all geared to increasing your knowledge about contamination control: Speaker sessions; experts will fill you in on the latest developments. Keynote speakers on health care and nanotechnology will offer a new perspective on their applications of contamination control.

Exhibitors will show their latest products and there will be a hands on workshop during the event. Presentations by demonstrators on the showcase floor will accompany this.

The workshops and tutorials will give you in depth learning. For newcomers in the field the tutorials will mean an instant increase in knowledge.

During the symposium matchmaking will take place between companies and students. Companies can pose ideas and questions and meet up with student who will work with these questions. Maybe your new products will be designed by these students.

Wednesday is the day for technical tours. You can go to leading companies on health care, micro-electronics or pharmaceuticals.

The event is packed with possibilities to make a leap into the future of contamination control.

Of course there is also time for networking and time for fun. The welcome reception with music, drinks and finger food will be held on Sunday afternoon.

And don’t miss the banquet at the Louwman Museum on Monday night, a nice moment to relax, together with the experts. Wednesday evening, at the closing dinner will be a proud moment to consider all you have seen and learnt about developments in the magnificent field of contamination control.

The world has totally changed because of contamination control and will continue to do so in the future and we are all part of this. Your expertise is highly needed today to meet the future challenges of products like microelectronics, pharmaceuticals, food and health care We wish you a pleasant stay in The Hague during the ISCC’18 event.

Organising committee ISCC’18

32 38

Not only Dusty and Bacter and experts in the world of contamination control are busy controlling particles and thinking about particle size. Nowadays everyone seems to be looking at particle size, even in commercials and advertisements.

They make us believe we have to brush our teeth with tooth paste containing micron sized particles. You ask yourself what the result of brushing with micron particles will be. No more plaque? This would be in contradiction with the result of an investigation into the state of our tooth brushes. Analyses in surveys show that our tooth brushes are contaminated with seven million possible particles which can cause illness. What happened to the micron particles?

Let’s look at smaller particles, have you tried shampoo with nanoparticles? Apparently the use of this shampoo leaves you with beautifully clean and lovely smelling hair. But doesn’t every shampoo do this? What is the added value of the nanoparticle, you ask yourself.

Maybe nanotechnology is just a sexy newcomer. Nanotechnology brings glitter and glamour, new ways of thinking and promises of new possibilities.

After having done a lot of research, we now know that nanotechnology gives an enormous boost to the development of new products and medicines. All this, thanks to contamination control. There would be no Internet of Things without cleanrooms.

No Apple, no Tesla without contamination control. This is the real world behind contamination control.

& Bacter

Dusty

CONTAMINATION CONTROL MAGAZINE | UITGAVE VAN VCCN | JAARGANG 31 | EDITIE 3-2018

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MGZN

ISCC’18 INTERNATIONAL SYMPOSIUM ON CONTAMINATION CONTROL THE NETHERLANDS, THE HAGUE 23 - 26 SEPTEMBER 2018

special edition

WE SHARE THE KNOWLEDGE Vereniging Contamination Control Nederland

A publication of VCCN, Vereniging Contamination Control Nederland Volume 31 edition 3-2018 EDITORS Philip van Beek | Noor Cloudt | Arthur Lettinga | Martijn Droog EDITORIAL COÖRDINATION Verenigingsbureau VCCN Korenmolenlaan 4 | 3447 GG Woerden T 088-401 06 50 v.vangent@vccn.nl AD SALES Call for rates 088-401 06 50 or visit www.vccn.nl MEMBERSHIP Personal membership € 50.- a year (incl. VAT) Company membership € 225.- a year (excl. VAT) PHOTO ACCOUNTING Archive VCCN DESIGN Bareminded www.bareminded.nl ACCOUNTABILITY The realization of C2MGZN has been carefully prepared, planned and executed. Nevertheless, VCCN cannot accept responsibility for any inaccuracies.

COPYRIGHTS With the exception laid down by law, no copyright may be reproduced and / or made public by means of print, microfilm, or in any digital, electronic or optical or other form without the written permission of the copyright holder (s) which also applies to all or part of the processing.

Contamination Control Magazine volume 3-2018

33

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0412 45

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info@dcrf.nl | 0412 451579 | Meerstraat 22, Heeswijk-Dinther DCRF Advertentie 2017 DEF (191 x 126).indd 1

Meer weten? www.dcrf.nl 26-06-17 17:35

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