Nanofabrication Technology—Application of Piezo Stage in Nanoimprint

Nanofabrication Technology—Application of Piezo Stage in Nanoimprint

Figure 1 Basic flow chart of nanoimprint technology 01. Nano Processing Technology In the past few decades of development, nano-processing technology has promoted the rapid development of integrated circuits and achieved high integration of devices. Nano-processing technology is a tool for humans to understand and learn the micro-world. Understanding this technology can help us better understand Nanotechnology and modern high-tech industries supported by nanotechnology.

The main difference between nano processing technology and traditional processing technology is that the size of the device structure formed by this process is on the order of nanometers. It can be divided into two categories: one is a top-down processing method, that is, a complex microstructure is formed layer by layer on the surface of a flat substrate, or it can be understood as a specific processing based on existing materials to achieve nanostructures and devices.

Currently, more mature nano-processing technologies, such as photolithography, nano-imprinting,

and probe technology, all belong to this type of processing technology. The other is a bottom-up processing method, which relies on the molecular self-assembly process, which can build nanostructures from the molecular level. This type of processing method is to obtain patterns through molecular growth without the existence of basic structures or materials. .

02 Nanoimprint Technology At present, the most widely used nanofabrication technology is the flat panel processing technology, and the flat panel processing technology relies on the photolithography technology.

Photolithography refers to the transfer of the integrated circuit pattern on the mask to the wafer through exposure and etching. The limit resolution of the current exposure system is half a wavelength. The nanoimprint technology realizes pattern transfer through physical deformation of the transfer medium instead of changing its chemical characteristics. Its resolution depends on the size of the mask, and the imprinting process is not limited by factors such as the wavelength of light and the numerical aperture of the objective lens. It is expected to break the resolution limit of traditional lithography process.

03 Basic Process of Nanoimprinting The basic idea of nanoimprint technology is to transfer the pattern on the mask to the substrate through a transfer medium. The transfer medium mostly uses polymer films (such as PMMA, PDMS, etc.). The nanoimprinting process includes two major steps of pattern copying and pattern transfer.

The mask is pressed into the transfer medium under pressure. After a period of time, the transfer medium will fully fill the nano-cavities, and then the pressure will be released for curing and demolding. An auxiliary transfer pattern is formed on the substrate. After the pattern copying process is over, it is first necessary to use anisotropic etching or reactive ion etching (RIE) to remove the resist residual layer on the substrate, and then start the pattern transfer process. The transfer pattern can be obtained by etching or lift-off (deposition, dissolution) methods. In the etching process, the pattern structure of the resist material on the substrate is used as a masking layer, and then the substrate is etched by anisotropic etching and other methods, so that the pattern is transferred to the substrate. Stripping consists of two steps: deposition and dissolution. First, a layer of metal film is plated on the surface of the resist, and then the resist and the metal film on the surface are dissolved with an organic solvent. The remaining metal film on the substrate is formed as the microstructure like the pattern on the mask plate, then the transferred pattern is obtained. The basic process of nanoimprinting is shown in Figure 1.

Because nanoimprint technology uses a 1:1 ratio mask to transfer graphics, there is no need to consider the problem of limited resolution.

CoreMorrow Piezo Displacement Platform In the process of nanoimprinting, CoreMorrow’s piezoelectric nano-platform and actuators can provide stable displacement output and control operation, with precision reaching the nanometer level, and at the same time providing greater output and fast response. CoreMorrow’s piezoelectric

nano stage is an important executive component of nanoimprint technology.

Examples of Parameters of CoreMorrow's Piezo Nanopositioning Stage

P12a.Xy200z100 Piezo Scanning Stage Model: P12A.XY200Z100S Closed loop sensor: Yes Motion axis: X Y Z Travel range: XY250μm/axis, Z100μm

P15.XYZ100 Piezoelectric Nano Positioning Stage Model: P15.XYZ100S Closed loop sensor: Yes Degree of freedom of movement: X Y Z Travel range: 120μm/axis

P15.XYZ300 Piezoelectric Nano Positioning Stage Model: P15.XYZ300S/K-C1 Closed loop sensor: Yes Motion axis: X Y Z Travel range: 300μm/axis

P17.XY200 Piezoelectric Nano Positioning Stage Model: P17.XY200S Closed loop sensor: Yes Motion axis: X Y Travel range: 187.5μm/axis

P18.XY200 Piezoelectric Nano Positioning Stage Model: P18.XY200S Closed loop sensor: Yes Motion axis: X Y Travel range: 250μm/axis