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641 701 761 901

Mass production with large batch sizes

BAK 1101 1250 1401 2000 501


BAK 1101

Platform summary ƒƒ Low cost mass production

Configure the BAK1101 for precision optics, optoelectronics or semiconductor applications for low cost mass production 7 days a week.

ƒƒ Large base plate for multiple sources ƒƒ Easy operation and maintenance

1. Choose your chamber geometry

1500

2000

ƒƒ Standard Throw - for typical metals and dielectrics depostion ƒƒ Extended Throw - for “lift off” ƒƒ Split Chamber - for reactive materials ƒƒ Extended rear for custom dep & etch requirements 2. Choose your Sources

Typical Layout

ƒƒ EBS electron beam guns (up to 3) ƒƒ A wide range of thermal sources ƒƒ Barrel sources and effusion cells ƒƒ Ion and plasma sources for PIAD or etch ƒƒ Back & front side heating ƒƒ Linear and round sputter cathodes

2200 2400

1200

1500

2600

3. Choose your tooling ƒƒ Dome as standard ƒƒ Additional options for:-- Flip systems -- Planetary -- Custom designs

600

4. Choose your process control 2100

Substrate size

Capacity (standard dome)

2” 3” 4” 6” 8”

Up to 216 Up to 104 Up to 64 Up to 24 Up to 12

Evatec Ltd. Lochrietstrasse 14 CH-8890 Flums Switzerland

Tel: + 41 81 720 1080 Fax: + 41 81 720 1081 info@evatecnet.com www.evatecnet.com

ƒƒ Khan system & process controller as standard ƒƒ Additional options for:-- Quartz or optical monitoring layer termination -- Optical pyrometry - temperature control

Product descriptions, photos and data are supplied within the brochure for general information only and may be superseded by any data contained within Evatec quotations, manuals or specifications.

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