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Remote plasma source performance and its impact on film deposition rates and properties in a new, commercial ALD system Mark J. Sowa, Mark J. Dalberth, Eric W. Deguns, Ritwik Bhatia, Ganesh Sundaram, Jill S. Becker Cambridge NanoTech, Inc., Cambridge, MA, USA

Remote plasma source performance and its impact on film deposition rates and properties  

Paper presented at ALD 2009 conference: Affects of plasma-generated co-reactants on atomic layer deposition (growth rates, process temps, ne...

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