MARKET OVERVIEW
Mask, also known as Photomask or Reticle, is a graphic master used in the lithography process commonly used in microelectronics processing technology. As a carrier of graphic information, Mask transfers the graphic to the base material through the exposure process, thereby realizing the transfer of the graphic.
MARKET SIZE & GROWTH
• The global EUV Mask Defect Inspection Equipment Market was valued at USD 1,502 million in 2024.
• It is projected to reach USD 3,737 million by 2031.
• The market is expected to grow at a CAGR of 14.3% during the forecast period.
